Deposition of undoped and H doped WOx (x≤3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors

Surface and Coatings Technology

Volumn 230, Issue , 2013, Pages 51-58

  Kostis, I ^a,b   Vasilopoulou, M ^a   Papadimitropoulos, G ^a   Stathopoulos, N ^b   Savaidis, S ^b   Davazoglou, D ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^b Technological and Educational Institute of Pireaus   (Greece)

Author keywords

Hot wire tungsten oxide films; Hydrogen doping of tungsten oxide films; Infrared spectra; Optical properties; Porosity of tungsten oxide films

Indexed keywords

INFRARED SPECTRUM; OXYGEN DEFICIENT; PULSED INJECTION; SPECTROSCOPIC ELLIPSOMETRY MEASUREMENTS; STOICHIOMETRIC FILMS; TUNGSTEN IONS; TUNGSTEN OXIDE; TUNGSTEN OXIDE FILMS;

ATOMIC LAYER DEPOSITION; DEPOSITION; ELECTRONIC STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS MIXTURES; HYDROGEN; METAL IONS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; OXYGEN; SEMICONDUCTING FILMS; SPECTROSCOPIC ELLIPSOMETRY; TUNGSTEN COMPOUNDS; ULTRATHIN FILMS; WIRE;

SEMICONDUCTOR DOPING;

EID: 84881310642     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.06.021     Document Type: Article

References (31)

1. T. Suntola, J. Antson, U.S. Patent 4.058.430 (1977).
2. Papadimitropoulos G., Vourdas N., Giannakopoulos K., Vasilopoulou M., Davazoglou D. J. Appl. Phys. 2011, 109:103527.
3. Vourdas N., Papadimitropoulos G., Kostis I., Vasilopoulou M., Davazoglou D. Thin Solid Films 2012, 520:3614.
4. Cu G., Zheng B., Han W.Q., Siegmar R., Liu J. Nano Lett. 2002, 2:829.
5. Liu J., Zhao Y., Zhang Z. J. Phys. Condens. Matter 2003, 15:L453-L461.
6. Liu J., Zhang Z., Zhao Y., Su X., Liu S., Wang E. Small 2005, 1:310.
7. Lee S.-H., Deshpande R., Parilla P., Jones K., B.To, Mahan A.H., Dillon A. Adv. Mater. 2006, 18:763.
8. Thangala J., Vaddiraju S., Bogale R., Thurman R., Powers T., Deb B., Sunkara M. Small 2007, 3:890.
9. Feng P., Wang X., Zhang H., Yang B., Wang Z., Gonzalez-Berrios A., Morell G., Weiner B. J. Phys. D: Appl. Phys. 2007, 40:5239.
10. Lou J., Ye B., Weng H., Du H., Wang Z., Wang X. J. Phys. D: Appl. Phys. 2008, 41:155410.
11. Wang S., He Y., Fang X., Zou J., Wang Y., Huang H., Costa P., Song M., Huang B., Liu C., Liaw P., Bando Y., Colberg D. Adv. Mater. 2009, 21:2387.
12. Lu D., Liang B., Ogino A., Nagatsu M. J. Vac. Sci. Technol. B 2010, (28):C2A98.
13. Houweling Z., Geus J., Schropp R.E.I. Chem. Vap. Deposition 2010, 16:179-184.
14. Houwelinga Z., Geus J., de Jong M., Harks P.-P., van der Werf K., Schropp Mater R.E.I. Chem. Phys. 2011, 131:375-386.
15. Sze S.M. VLSI Technology 1988, McGraw-Hill.
16. Vasilopoulou M., Palilis L., Georgiadou D., Douvas A., Argitis P., Kennou S., Sygellou L., Papadimitropoulos G., Kostis I., Stathopoulos N., Davazoglou D. Adv. Funct. Mater. 2011, 21:1489.
17. Vasilopoulou M., Palilis L.C., Georgiadou D.G., Kennou S., Kostis I., Davazoglou D., Argitis P. Appl. Phys. Lett. 2012, 100:013311.
18. Ackerman R., Rauh E. J. Phys. Chem. 1963, 67:2596.
19. Sha L., Qui Z.J. Int. J. Refract. Met. Hard Mater. 2008, 26:362.
20. Palik D. Handbook of Optical Constants of Solids 1985, Academic Press.
21. Davazoglou D., Donnadieu A. J. Appl. Phys. 1992, 72:1502-1511.
22. Shaposhnikov V., Migas D., Rodin V., Borishenko V. Phys. Stat. Sol., B 2011, 248:1471.
23. Green M., Travlos A. Philos. Mag. B 1985, 51:501.
24. Bulett D. J. Phys. C 1983, 16:2197.
25. Weaver J., Olson C., Lynch D. Phys. Rev. 1975, B12:1293.
26. Cristensen N., Feuerbacher B. Phys. Rev. B 1974, 10:2349.
27. Daniel F., Desbat B., Lassegues J.C., Gerand B., Figlarz M. J. Solid State Chem. 1987, 67:235.
28. Díaz-Reyes J., Dorantes-Garcia V., Pérez-Benítez A., Balderas-López J.A. Superfic. Vac. 2008, 21(2):12-17.
29. Pfeifer J., Guifang Cao, Tekula-Buxbaum P., Kiss B.A., Farkas-Jahnke M., Vadasdi K. J. Solid State Chem. 1995, 119:90.
30. Gotić M., Ivanda M., Popović S., Music S. Mater. Sci. Eng. 2000, B77:193-201.
31. Wright C.J. J. Solid State Chem. 1977, 20:89.