SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 25, Issue 29, 2013, Pages 3934-3947

Mechanochromic photonic gels

(4) Chan, Edwin P a Walish, Joseph J b Urbas, Augustine M c Thomas, Edwin L d

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b Massachusetts Institute of Technology Cambridge (United States)

c AIR FORCE RESEARCH LABORATORY (United States)

d Rice University (United States)

Author keywords

block copolymers; gels; mechanochromism; photonic crystals; stimuli responsive materials

Indexed keywords

LOCAL ENVIRONMENTS; MECHANICAL DEFORMATION; MECHANOCHROMISM; PHYSICAL STRUCTURES; POLYMER GEL SYSTEMS; SENSING APPLICATIONS; STIMULI-RESPONSIVE MATERIALS; STRUCTURAL COLOR;

BLOCK COPOLYMERS; COLOR; ELECTRIC PROPERTIES; MATERIALS; MECHANICAL ENGINEERING; PHOTONIC CRYSTALS; POLYMERS; SCHEDULING; SENSORS;

GELS;

ARTICLE; BLOCK COPOLYMERS; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; GEL; LIGHT; MECHANICAL STRESS; MECHANOCHROMISM; MICROELECTROMECHANICAL SYSTEM; PHOTON; PHOTONIC CRYSTALS; RADIATION EXPOSURE; STIMULI-RESPONSIVE MATERIALS; SURFACE PLASMON RESONANCE; TRANSDUCER;

BLOCK COPOLYMERS; GELS; MECHANOCHROMISM; PHOTONIC CRYSTALS; STIMULI-RESPONSIVE MATERIALS;

EQUIPMENT DESIGN; GELS; LIGHT; MICRO-ELECTRICAL-MECHANICAL SYSTEMS; PHOTONS; STRESS, MECHANICAL; SURFACE PLASMON RESONANCE; TRANSDUCERS;

EID: 84881153652 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201300692 Document Type: Article

Times cited : (152)

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