Diffusion-controlled, self-organized growth of symmetric wrinkling patterns

Advanced Materials

Volumn 21, Issue 13, 2009, Pages 1358-1362

  Chung, Jun Young ^a   Nolte, Adam J ^a   Stafford, Christopher M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IN-DIFFUSION; IN-SITU; SELF ORGANIZED GROWTH; SOLVENT VAPORS; STRESS STATE; SURFACE WRINKLING; TARGET PATTERNS; TOPOGRAPHIC IMAGES; UV LAMPS; UV/OZONE; WRINKLING PATTERNS;

CHARGE COUPLED DEVICES; OPTICAL MICROSCOPY; PLASTIC FILMS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; TOLUENE;

POLYMER FILMS;

EID: 66149106269     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200803209     Document Type: Article

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