Simulating realistic imaging conditions for in situ liquid microscopy

Ultramicroscopy

Volumn 135, Issue , 2013, Pages 36-42

  Welch, David A ^a   Faller, Roland ^a   Evans, James E ^b   Browning, Nigel D ^c  

^a University of California   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^c PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

Atomistic model; Image simulation; In situ microscopy; Nanoparticle growth

Indexed keywords

ATOMISTIC MODELS; HIGH-ANGLE ANNULAR DARK FIELDS; IMAGE SIMULATIONS; IN-SITU MICROSCOPIES; IN-SITU TRANSMISSION ELECTRON MICROSCOPIES; MICROSCOPIC TECHNIQUES; NANOPARTICLE GROWTHS; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

COMPUTER SIMULATION; IN SITU PROCESSING; TRANSMISSION ELECTRON MICROSCOPY;

NANOPARTICLES;

NANOPARTICLE;

ARTICLE; ATOM; ELECTRON MICROSCOPY; EXPERIMENTAL STUDY; IMAGE ANALYSIS; IMAGE QUALITY; IMAGING SYSTEM; IN SITU LIQUID MICROSCOPY; LIQUID; MEMBRANE; MICROSCOPE; MICROSCOPY; MOLECULAR MODEL; PARAMETERS; PREDICTION; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SIMULATION; THICKNESS; VIRTUAL REALITY;

EID: 84880631100     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2013.05.010     Document Type: Article

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