Plasma polymerization of C4Cl6 and C 2H2Cl4 at atmospheric pressure

Polymer

Volumn 54, Issue 16, 2013, Pages 4085-4092

  Hubert, J ^a   Poleunis, C ^b   Delcorte, A ^b   Laha, P ^c   Bossert, J ^a   Lambeets, S ^a   Ozkan, A ^a   Bertrand, P ^b   Terryn, H ^c   Reniers, F ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^c VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

Chlorine; Plasma polymerization; XPS

Indexed keywords

ATMOSPHERIC PRESSURE; CHLORINE; DEPOSITION RATES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; ELLIPSOMETRY; IONS; MONOMERS; ORGANIC COATINGS; PHOTOELECTRONS; PHOTONS; PLASMA POLYMERIZATION; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

BOND DISSOCIATION ENERGIES; DIELECTRIC BARRIER DISCHARGES; DYNAMIC SECONDARY ION MASS SPECTROMETRY; HYDROGEN CONCENTRATION; LIQUID MONOMERS; PLASMA CONDITIONS; WATER CONTACT ANGLE;

CHLORINE COMPOUNDS;

EID: 84880044366     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2013.05.068     Document Type: Article

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