Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies

Langmuir

Volumn 29, Issue 24, 2013, Pages 7433-7438

  Pearson, Anthony C ^a   Linford, Matthew R ^a   Harb, John N ^b   Davis, Robert C ^a  

^a Brigham Young University   (United States)

^b Brigham Young University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; NANOPARTICLE PAIRS; PALLADIUM NANOPARTICLES; PD NANO PARTICLE; POLY(ACRYLIC ACID ); POLYACRYLIC ACIDS; REACTIVE ION ETCH; TWO-DIMENSION;

BLOCK COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; MICELLES; MONOLAYERS; NANOPARTICLES; POLYSTYRENES; REACTIVE ION ETCHING;

CARBOXYLIC ACIDS;

EID: 84879163146     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la304486x     Document Type: Article

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