Low temperature deposition of high performance lead strontium titanate thin films by in situ RF magnetron sputtering

Journal of the American Ceramic Society

Volumn 96, Issue 6, 2013, Pages 1682-1684

  Li, Kui ^a   Dong, Xianlin ^a   Rémiens, Denis ^b   Lei, Xiuyun ^a   Li, Tao ^a   Du, Gang ^a   Wang, Genshui ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCY DEPENDENCE; IN-SITU CRYSTALLIZATION; LEAD STRONTIUM TITANATE; LOW-TEMPERATURE DEPOSITION; MICROWAVE TUNABLE DEVICES; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE;

DEPOSITS; ELECTRIC FIELDS; LEAD; MAGNETRON SPUTTERING; SILICON; STOICHIOMETRY; STRONTIUM TITANATES; THIN FILMS;

VAPOR DEPOSITION;

EID: 84878675900     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/jace.12198     Document Type: Article

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