Reversible intercalation of hexagonal boron nitride with Brønsted acids

Journal of the American Chemical Society

Volumn 135, Issue 22, 2013, Pages 8372-8381

  Kovtyukhova, Nina I ^a   Wang, Yuanxi ^a   Lv, Ruitao ^a   Terrones, Mauricio ^a   Crespi, Vincent H ^a   Mallouk, Thomas E ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HEXAGONAL BORON NITRIDE; HEXAGONAL BORON NITRIDE (H-BN); INTERCALATION PROCESS; LAYERED COMPOUND; MOLECULAR DYNAMICS CALCULATION; NON-COVALENT INTERACTION; OXIDIZING AGENTS; X-RAY PHOTOELECTRONS;

BORON NITRIDE; ELECTRONIC STRUCTURE; GRAPHENE; GRAPHITE; IONS; MOLECULAR DYNAMICS; REDOX REACTIONS;

BROMINE COMPOUNDS;

BORON NITRIDE NANOTUBE; BRONSTED ACID; GRAPHENE; GRAPHITE; OXIDIZING AGENT; PERCHLORIC ACID; PHOSPHORIC ACID; SULFURIC ACID;

ARTICLE; ATOM; CALCULATION; CONTROLLED STUDY; DESICCATION; ELECTRONICS; INTERCALATION COMPLEX; MOLECULAR DYNAMICS; SPECTROSCOPY; THERMAL CONDUCTIVITY; VIBRATIONAL SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON COMPOUNDS; GRAPHITE; MOLECULAR DYNAMICS SIMULATION; MOLECULAR STRUCTURE; PARTICLE SIZE; PERCHLORATES; PHOSPHORIC ACIDS; SULFURIC ACIDS; SURFACE PROPERTIES;

EID: 84878629240     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja403197h     Document Type: Article

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