-
1
-
-
49649099742
-
Density multiplication and improved lithography by directed block copolymer assembly
-
Ricardo Ruiz, Huiman Kang, Francois A. Detcheverry, Elizabeth Dobisz, Dan S. Kercher, Thomas R. Albrecht, Juan J. de Pablo, Paul F. Nealey, "Density multiplication and improved lithography by directed block copolymer assembly", Science 321, 936-939 (2008).
-
(2008)
Science
, vol.321
, pp. 936-939
-
-
Ruiz, R.1
Kang, H.2
Detcheverry, F.A.3
Dobisz, E.4
Kercher, D.S.5
Albrecht, T.R.6
De Pablo, J.J.7
Nealey, P.F.8
-
2
-
-
84878380932
-
Field-based simulations of directed block copolymer assembly
-
Glenn Fredrickson, "Field-based simulations of directed block copolymer assembly", 2012 MRS Fall Meeting and Exhibit, S9.01, (2012).
-
(2012)
2012 MRS Fall Meeting and Exhibit
, vol.S9
, Issue.1
-
-
Fredrickson, G.1
-
3
-
-
84878414948
-
Sub-30 nm contact hole process study using directed self-assembly lithography
-
th International Microprocesses and Nanotechnology Conference (MNC2012), 2A-10-4, (2012).
-
(2012)
th International Microprocesses and Nanotechnology Conference (MNC2012)
-
-
Yonemitsu, H.1
Sato, H.2
Seino, Y.3
Kato, H.4
Kanno, M.5
Kobayashi, K.6
Kawanishi, A.7
Kodera, K.8
Azuma, T.9
-
4
-
-
84878408937
-
Process and simulation studies of contact holes fabricated using directed self-assembly lithography
-
Hiroki Yonemitsu, Hironobu Sato, Yuriko Seino, Hirokazu Kato, Masahiro Kanno, Katsutoshi Kobayashi, Ayako Kawanishi, Katsuyoshi Kodera, Tsukasa Azuma, "Process and simulation studies of contact holes fabricated using directed self-assembly lithography", 2012 MRS Fall Meeting and Exhibit, S9.04, (2012).
-
(2012)
2012 MRS Fall Meeting and Exhibit
, vol.S9
, Issue.4
-
-
Yonemitsu, H.1
Sato, H.2
Seino, Y.3
Kato, H.4
Kanno, M.5
Kobayashi, K.6
Kawanishi, A.7
Kodera, K.8
Azuma, T.9
-
5
-
-
84863748150
-
Nanopatterning of diblock copolymer directed self-assembly lithography with wet development
-
Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma, "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development", Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031305 (2012)
-
(2012)
Journal of Micro/Nanolithography, MEMS, and MOEMS
, vol.11
, Issue.3
, pp. 031305
-
-
Muramatsu, M.1
Iwashita, M.2
Kitano, T.3
Toshima, T.4
Somervell, M.5
Seino, Y.6
Kawamura, D.7
Kanno, M.8
Kobayashi, K.9
Azuma, T.10
-
6
-
-
84887383910
-
Contact hole shrink process using directed self-assembly
-
Alternative Lithographic Technologies IV
-
Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hirokazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima, "Contact hole shrink process using directed self-assembly", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230Y, (2012).
-
(2012)
Proc. SPIE
, vol.8323
-
-
Seino, Y.1
Yonemitsu, H.2
Sato, H.3
Kanno, M.4
Kato, H.5
Kobayashi, K.6
Kawanishi, A.7
Azuma, T.8
Muramatsu, M.9
Nagahara, S.10
Kitano, T.11
Toshima, T.12
-
7
-
-
84878391520
-
Sub-30 nm via interconnects fabricated using directed self-assembly
-
th International Conference on Micro and Nano Engineering (MNE2012), P088-046, (2012).
-
(2012)
th International Conference on Micro and Nano Engineering (MNE2012)
-
-
Kato, H.1
Seino, Y.2
Yonemitsu, H.3
Sato, H.4
Kanno, M.5
Koyayashi, K.6
Kawanishi, A.7
Imamura, T.8
Omura, M.9
Nakamura, N.10
Azuma, T.11
|