Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Peters, Andrew J ^a   Lawson, Richard A ^a   Ludovice, Peter J ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

; Coarse grained; Computational; Directed self assembly; GPU; LER; LWR; Molecular dynamics; PDI; Roughness

Indexed keywords

COARSE-GRAINED; COMPUTATIONAL; DIRECTED SELF-ASSEMBLY; GPU; LER; LWR; PDI;

BLOCK COPOLYMERS; COMPUTATIONAL CHEMISTRY; MOLECULAR DYNAMICS; POLYDISPERSITY; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS;

ROUGHNESS MEASUREMENT;

EID: 84878393858     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2021443     Document Type: Conference Paper

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