Pulsed laser ablation of complex oxides: The role of congruent ablation and preferential scattering for the film stoichiometry

Applied Physics Letters

Volumn 101, Issue 13, 2012, Pages

  Wicklein, S ^a   Sambri, A ^b   Amoruso, S ^b   Wang, X ^b   Bruzzese, R ^b   Koehl, A ^a   Dittmann, R ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b UNIVERSITY OF NAPLES FEDERICO II   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BACKGROUND GAS; COMPLEX OXIDES; FILM STOICHIOMETRY; LASER FLUENCES; MODEL MATERIALS; PHYSICAL MECHANISM; PREFERENTIAL SCATTERING; THIN FILM ANALYSIS;

CHEMICAL ANALYSIS; FILM GROWTH; LASER DIAGNOSTICS; MODELS; PULSED LASER DEPOSITION; SCATTERING; STOICHIOMETRY; THIN FILMS;

ABLATION;

EID: 84877607732     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4754112     Document Type: Article

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