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Applied Physics Letters

Volumn 98, Issue 10, 2011, Pages

Substrate heating influence on the deposition rate of oxides during pulsed laser deposition in ambient gas

(5) Amoruso, S a Aruta, C a Bruzzese, R a Wang, X a Scotti Di Uccio, U a

a UNIVERSITY OF NAPLES FEDERICO II (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT GAS; AMBIENT PRESSURES; BACKGROUND GAS; MODEL-BASED; OXYGEN ATMOSPHERE; OXYGEN PRESSURE; ROOM TEMPERATURE; SCATTERING PROCESS; SUBSTRATE HEATING; SUBSTRATE TEMPERATURE;

ATMOSPHERIC TEMPERATURE; DEPOSITION; DEPOSITION RATES; HIGH ENERGY ELECTRON DIFFRACTION; OXYGEN; PULSED LASER DEPOSITION; QUARTZ;

PULSED LASERS;

EID: 79952677951 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3565157 Document Type: Article

Times cited : (29)

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