Low-temperature metal-oxide thin-film transistors formed by directly photopatternable and combustible solution synthesis

ACS Applied Materials and Interfaces

Volumn 5, Issue 9, 2013, Pages 3565-3571

  Rim, You Seung ^a   Lim, Hyun Soo ^a   Kim, Hyun Jae ^a  

^a Yonsei University   (South Korea)

Author keywords

flexible electronics; low temperature synthesis; metal oxide semiconductor; photo patterning; solution process

Indexed keywords

CHEMICALLY MODIFIED; ELECTRICAL CHARACTERISTIC; LOW TEMPERATURE SYNTHESIS; METAL OXIDE SEMICONDUCTOR; OXIDE SEMICONDUCTOR; PHOTO PATTERNING; SOLUTION PROCESS; THIN-FILM TRANSISTOR (TFTS);

ACETONE; FLEXIBLE ELECTRONICS; MOS DEVICES; OXIDE FILMS; PHOTORESISTS; TEMPERATURE;

THIN FILM TRANSISTORS;

EID: 84877342417     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am302722h     Document Type: Article

References (22)

1. Kim, Y.-H.; Heo, J.-S.; Kim, T.-H.; Park, S.; Yoon, M.-H.; Kim, J.; Oh, M. S.; Yi, G.-R.; Noh, Y.-Y.; Park, S. K. Nature 2012, 489, 128-132
2. Kim, M.-G.; Kanatzidis, M. G.; Facchetti, A.; Marks, T. J. Nat. Mater. 2011, 17, 382-388
3. Banger, K. K.; Yamashita, Y.; Mori, K.; Peterson, R. L.; Leedham, T.; Rickard, J.; Sirringhaus, H. Nat. Mater. 2010, 10, 45-50
4. Walker, D. E; Major, M.; Yadzi, M. B.; Klyszcz, A.; Haeming, M.; Bonrad, K.; Melzer, C.; Donner, W.; Seggern, H. V. ACS Appl. Mater. Interfaces 2012, 4, 6835-6841
5. Pasquarelli, R. M.; Ginley, D. S.; O'Hayre, R. Chem. Soc. Rev. 2011, 40, 5406-5441
6. Han, H.; Bissell, J.; Yaghmaie, F.; Davis, C. E. Langmuir 2010, 26, 515-520
7. Parashkov, R.; Becker, E.; Riedl, T.; Johannes, H.; Kowalsky, W. Proc. IEEE 2005, 93, 1321-1329
8. Han, Y.-H.; Taylor, A.; Mantle, M. D.; Knowles, K. M. J. Sol-Gel Sci. Technol. 2007, 43, 111-123
9. Ryu, S. H.; Park, Y. C.; Mativenga, M.; Kang, D. H.; Jang, J. ECS Solid-State Lett. 2012, 1, Q17-Q19
10. Han, S.-Y.; Herman, G. S.; Chang, C.-H. J. Am. Chem. Soc. 2011, 133, 5166-5169
11. Shinmou, K.; Tohge, N.; Minami, T. Jpn. J. Appl. Phys. 1994, 33, 1181-1184
12. Jiang, K.; Anderson, J. T.; Hoshino, K.; Li, D.; Wager, J. F.; Keszler, D. A. Chem. Mater. 2011, 23, 945-952
13. Kim, G. H.; Shin, H. S.; Ahn, B. D.; Kim, K. H.; Park, W. J.; Kim, H. J. J. Electrochem. Soc. 2009, 156, H7-H9
14. Socrates, G. Infrared Characteristic Group Frequencies; John Wiley & Sons: New York, 1994.
15. Song, K.; Jung, Y.; Kim, Y.; Kim, A.; Hwang, J. K.; Sung, M. M.; Moon, J. J. Mater. Chem. 2011, 21, 14646-14654
16. Liang, C. Y.; Schimitschek, E. J.; Trias, J. A. J. Inorg. Nucl. Chem. 1970, 32, 811-831
17. Weihua, Z.; Gaoyang, Z.; Zhiming, C. Mater. Sci. Eng., B 2003, 99, 168-172
18. Habouti, S.; Solterbeck, C.-H.; Es-Souni, M. J. Sol-Gel Sci. Technol. 2007, 42, 257-263
19. Calzada, M. L.; González, A.; Poyato, R.; Pardo, L. J. Mater. Chem. 2003, 13, 1451-1457
20. Hong, D.; Yerubandi, G.; Chiang, H. Q.; Spiegelberg, M. C.; Wager, J. F. Crit. Rev. Solid-State Mater. 2008, 33, 101-132
21. Wager, J. F.; Keszler, D. A.; Presley, R. E Transparent Electronics; Springer: New York, 2008; p 136.
22. Rim, Y. S.; Jeong, W. H.; Kim, D. L.; Lim, H. S.; Kim, K. M.; Kim, H. J. J. Mater. Chem. 2012, 22, 12491-12497