Low-threshold whispering-gallery-mode microlasers fabricated in a Nd:glass substrate by three-dimensional femtosecond laser micromachining

Optics Letters

Volumn 38, Issue 9, 2013, Pages 1458-1460

  Lin, Jintian ^a,e   Xu, Yingxin ^b   Song, Jiangxin ^a,e   Zeng, Bin ^a   He, Fei ^a   Xu, Huailiang ^c   Sugioka, Koji ^d   Fang, Wei ^b   Cheng, Ya ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b ZHEJIANG UNIVERSITY   (China)

^c JILIN UNIVERSITY   (China)

^d RIKEN   (Japan)

^e UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION PROCEDURE; FEMTOSECOND LASER MICROMACHINING; GLASS SUBSTRATES; LASER ANNEALING; QUALITY FACTORS; ROOM TEMPERATURE; SURFACE SMOOTHING; THREE-DIMENSIONAL MICROMACHINING;

CARBON DIOXIDE; DIELECTRIC MATERIALS; FABRICATION; GLASS; MICROCAVITIES; SUBSTRATES; THREE DIMENSIONAL; ULTRASHORT PULSES;

WHISPERING GALLERY MODES;

GLASS; NEODYMIUM;

ARTICLE; CHEMISTRY; FLUORESCENCE IMAGING; LASER; LIGHT RELATED PHENOMENA; METHODOLOGY; MICROTECHNOLOGY; TIME; PROCEDURES;

GLASS; LASERS; MICROTECHNOLOGY; NEODYMIUM; OPTICAL IMAGING; OPTICAL PROCESSES; TIME FACTORS;

EID: 84877124153     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.38.001458     Document Type: Article

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