Femtosecond multi-beam interference lithography based on dynamic wavefront engineering

Optics Express

Volumn 21, Issue 8, 2013, Pages 9851-9861

  Zhou, Qiang ^a,b   Yang, Wenzheng ^a   He, Fengtao ^b   Stoian, Razvan ^c   Hui, Rongqing ^d   Cheng, Guanghua ^a,c  

^a XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS   (China)

^b XI AN UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^c UNIVERSITÉ JEAN MONNET   (France)

^d University of Kansas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT MODULATORS; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; ULTRAFAST LASERS;

ASYMMETRIC WAVES; BEAM MULTIPLEXING; DYNAMIC SPATIAL; MULTI-BEAM INTERFERENCE PATTERN; MULTIBEAM INTERFERENCES; PERIODIC MICROSTRUCTURE; SPATIAL LIGHT MODULATORS; SPATIALLY MODULATED;

LOADING;

ARTICLE; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; LASER; OPTICAL INSTRUMENTATION; PHOTOGRAPHY; RADIATION EXPOSURE; REFRACTOMETRY; SURFACE PROPERTY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; LENSES; PHOTOGRAPHY; REFRACTOMETRY; SURFACE PROPERTIES;

EID: 84877111197     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.009851     Document Type: Article

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