A comparative study of thermal annealing effects under various atmospheres on nano-structured CdS thin films prepared by CBD

Journal of Alloys and Compounds

Volumn 573, Issue , 2013, Pages 112-117

  Kong, Lingjun ^a   Li, Jianmin ^a   Chen, Guilin ^a   Zhu, Changfei ^a   Liu, Weifeng ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Annealing; Cadmium sulfide; Chemical bath deposition; Recrystallization; Structural properties

Indexed keywords

ANNEALING TEMPERATURES; CHEMICAL-BATH DEPOSITION; COMPARATIVE STUDIES; CRYSTALLOGRAPHIC PHASIS; OPTIMAL ANNEALING; THERMAL ANNEALING EFFECTS; UV-VIS-NIR SPECTROPHOTOMETERS; VARIOUS ATMOSPHERE;

ANNEALING; CADMIUM CHLORIDE; COATINGS; CRYSTALLIZATION; DEPOSITS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; STRUCTURAL PROPERTIES; SUBSTRATES; THIN FILMS;

CADMIUM SULFIDE;

EID: 84877054835     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.03.294     Document Type: Article

References (29)

1. K. Sivaramamoorthy, S. Asath Bahadur, M. Kottaisamy, and K.R. Murali J. Alloys Comp. 503 2010 170 176
2. A.A. Yadav, and E.U. Masumdar J. Alloys Comp. 509 2011 5394 5399
3. S. Bonilla, and E.A. Dalchiele Thin Solid Films 204 1991 397 403
4. T.L. Chu, S.S. Chu, J. Britt, C. Frekides, C. Wang, and C.Q. Wu IEEE Trans. Electron. Dev. Lett. 13 1992 303 304
5. J. Nishino, T. Kawarada, S. Ohshio, H. Saitoh, K. Maruyama, and J. Mater Sci. Lett. 16 1997 629 631
6. N. Amin, T. Isaka, T. Okamoto, A. Yamada, and M. Konagai Jpn. J. Appl. Phys. 38 1 1999 4666
7. M. Cao, Y. Sun, J. Wu, X. Chen, and N. Dai J. Alloys Comp. 508 2010 297 300
8. Fangyang Liu, Yanqing Lai, Jun Liu, Bo Wang, Sanshuang Kuang, Zhian Zhang, Jie Li, and Yexiang Liu J. Alloys Comp. 493 2010 305 308
9. R.S. Mane, and C.D. Lokhande Thin Solid Films 304 1997 56 60
10. G. Sasikala, R. Dhnasekaran, and C. Subramanian Thin Solid Films 302 1997 71 76
11. D.S. Boyle, A. Bayer, M.R. Heinrich, O. Robbe, and P. O'Brien Thin Solid Films 150 2000 361 362
12. Y. Hashimoto, N. Kohara, T. Negami, N. Nishitani, and T. Wada Sol. Energy Mater. Sol. Cells 50 1998 71 77
13. Rajesh K. Katiyar, Satyaprakash Sahoo, A.P.S. Gaur, Arun Singh, G. Morell, and R.S. Katiyar J. Alloys Comp. 509 2011 10003 10006
14. I.D. Olekseyuk, H.Ye. Davidyuk, O.V. Parasyuk, S.V. Voronyuk, V.O. Halka, and V.A. Oksyuta J. Alloys Comp. 309 2000 39 44
15. J. Britt, and C. Ferekides Appl. Phys. Lett. 62 1993 2851 2852
16. K. Sentil, D. Mangalaraj, and Sa.K. Narayandass Appl. Surf. Sci. 476 2001 169 170
17. V.I. Klimov, A.A. Mikhailovsky, S. Xu, A. Malko, J.A. Hollingsworth, C.A. Leatherdale, H.-J. Eisler, and M.G. Bawendi Science 290 2000 314 317
18. M. Bruchez Jr., M. Moronne, P. Gin, S. Weiss, and A.P. Alivisatos Science 281 1998 2013 2016
19. C.S. Ferekides, D. Marinskiy, V. Viswanathan, B. Tetaly, V. Palekis, P. Selvaraj, and D.L. Morel Thin Solid Films 520 2000 361 362
20. J.M. Squeiros, R. Machorro, and L.E. Regalado Appl. Opt. 27 1988 2549 2553
21. H.R. Pouretedal, A. Norozi, M.H. Keshavarz, and A. Semnani J. Hazard. Mater. 2009 162 674
22. V. Wood, J.E. Halpert, M.J. Panzer, M.G. Bawendi, and V. Bulovic Nano Lett. 9 2009 2367
23. G. Hodes Chemical Solution Deposition of Semiconductor Films 2002 Marcel Dekker New York
24. P.N. Gibson, M.E. Ozsan, D. Lincot, P. Cowache, and D. Summa Thin Solid Films 34 2000 361 362
25. H. Metin, and R. Esen J. Cryst. Growth 258 2003 141 148
26. T.D. Dzhafarov, M. Altunbas, A.I. Kopya, V. Novruzov, and E. Bacaksiz J. Phys. D32 1999 L125
27. O. Conde, A.G. Rolo, M.J.M. Gomes, C. Ricolleau, and D.J. Barber J. Cryst. Growth 247 2003 371 380
28. Z. Rizwan, B.Z. Azmi, and M.G.M. Sabri Optoelectron. Adv. Mater. 5 4 2011 393 397
29. H. Zhu, D. Yang, G. Yu, H. Zhang, and K. Yao Nanotechnology 17 2006 2386