Fabrication of photonic ring resonator device in silicon waveguide technology using soft UV-nanoimprint lithography

IEEE Photonics Technology Letters

Volumn 20, Issue 7, 2008, Pages 490-492

  Plachetka, U ^a   Koo, N ^a   Wahlbrink, T ^a   Bolten, J ^a   Waldow, M ^b   Plotzing T ^b   Forst M ^b   Kurz, H ^a  

^a Advanced Microelectronic Center Aachen (AMICA)   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Integrated optics; Lithography; Nanoimprint; Photonics; Resonator

Indexed keywords

NANOIMPRINT LITHOGRAPHY; OPTICAL RESONATORS; PHOTONIC DEVICES; PHOTONICS; SILICON ON INSULATOR TECHNOLOGY; FABRICATION; INTEGRATED OPTICS; OPTICAL LOSSES; OPTICAL MATERIALS; RESONATORS;

SILICON WAVEGUIDE TECHNOLOGY; SPECTRAL RESPONSE MEASUREMENTS;

INTEGRATED OPTICS; NANOIMPRINT LITHOGRAPHY;

FABRICATION METHOD; HIGH QUALITY; NANO-IMPRINT; PROPAGATION LOSS; RESONATOR DEVICES; RING RESONATOR; SILICON WAVEGUIDE; SILICON-ON-INSULATOR SUBSTRATES; SPECTRAL RESPONSE MEASUREMENTS; TRANSFER PROCESS; ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY; UV NANOIMPRINT LITHOGRAPHY;

EID: 41149172541     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2008.918386     Document Type: Article

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