Effect of the sputtering parameters on the physical properties and photocatalytic reactivity of TiO2 thin films prepared by an RF magnetron sputtering deposition method

Research on Chemical Intermediates

Volumn 39, Issue 4, 2013, Pages 1593-1602

  Ebrahimi, Afshin ^a   Kitano, Masaaki ^a   Iyatani, Kazushi ^a   Horiuchi, Yu ^a   Takeuchi, Masato ^a   Matsuoka, Masaya ^a   Anpo, Masakazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AR GAS PRESSURE; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC REACTIVITY; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SPUTTERING PARAMETERS; SUBSTRATE TEMPERATURE; VISIBLE-LIGHT IRRADIATION;

DEPOSITION; ELECTRONIC PROPERTIES; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PHOTOCATALYSIS; PHOTOCATALYSTS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; VAPOR DEPOSITION;

TITANIUM DIOXIDE;

EID: 84876479716     PISSN: 09226168     EISSN: 15685675     Source Type: Journal    
DOI: 10.1007/s11164-012-0624-8     Document Type: Conference Paper

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