Preparation of Titanium-Silicon Binary Oxide Thin Film Photocatalysts by an Ionized Cluster Beam Deposition Method. Their Photocatalytic Activity and Photoinduced Super-Hydrophilicity

Journal of Physical Chemistry B

Volumn 107, Issue 51, 2003, Pages 14278-14282

  Takeuchi, Masato ^a   Dohshi, Satoru ^a   Eura, Takashi ^b   Anpo, Masakazu ^a  

^a Osaka Prefecture University   (Japan)

^b Ion Eng Res Institute Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; HYDROPHILICITY; ION SOURCES; IONIZATION; IRRADIATION; PHOTOCATALYSIS; SILICA; TITANIUM OXIDES;

ANTI-FOGGING; PHOTOCATALYSTS;

THIN FILMS;

EID: 0346434958     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0308514     Document Type: Article

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