Effect of Nd3+ incorporation on the microstructure and chemical structure of RF sputtered ZnO thin films

Materials Science and Engineering: B

Volumn 178, Issue 9, 2013, Pages 609-616

  Gottardi, Gloria ^a   Pandiyan, Rajesh ^a,b,c   Micheli, Victor ^a   Pepponi, Giancarlo ^a   Gennaro, Salvatore ^a   Bartali, Ruben ^a   Laidani, Nadhira ^a  

^a FONDAZIONE BRUNO KESSLER   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

^c PSL RESEARCH UNIVERSITY   (France)

Author keywords

AES; Neodymium; Rare earth doping; XPS; XRD; ZnO thin films

Indexed keywords

ATOMS; AUGER ELECTRON SPECTROSCOPY; CRYSTAL ATOMIC STRUCTURE; FLUORESCENCE; GLASS SUBSTRATES; II-VI SEMICONDUCTORS; METALLIC FILMS; MICROSTRUCTURE; NEODYMIUM; NEODYMIUM COMPOUNDS; RARE EARTHS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE; ZINC SULFIDE;

AES; COSPUTTERING; DOPED ZNO; METALLICS; ND-DOPED; PURE ZNO; RARE-EARTHS DOPING; XRD; ZNO FILMS; ZNO THIN FILM;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84876412789     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2012.12.013     Document Type: Article

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