Anisotropic laser-induced damage threshold and residual stress of TiO 2 sculptured thin films

Journal of Nanoscience and Nanotechnology

Volumn 13, Issue 2, 2013, Pages 824-828

  Xiao, Xiudi ^a,b   Miao, Lei ^a   Zhang, Ming ^a   Xu, Gang ^a   Shao, Jianda ^b   Fan, Zhengxiu ^b  

^a GUANGZHOU INSTITUTE OF ENERGY CONVERSION   (China)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Anisotropic laser induced damage; Raman spectra; Residual stress; TiO2 thin films

Indexed keywords

ANISOTROPIC NANOSTRUCTURES; ELECTRON BEAM EVAPORATION; LASER INDUCED DAMAGE THRESHOLDS; LASER-INDUCED DAMAGE; OPTICAL AND MECHANICAL PROPERTIES; OPTICAL INTERFEROMETER; SCULPTURED THIN FILMS; TIO;

ANISOTROPY; DEPOSITION; ELECTRON BEAMS; LASER DAMAGE; MECHANICAL PROPERTIES; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; RAMAN SCATTERING; RESIDUAL STRESSES; THIN FILMS; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROSCOPY;

VAPOR DEPOSITION;

EID: 84876216303     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2013.5961     Document Type: Conference Paper

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