Ultrathin specimen preparation by a low-energy Ar-ion milling method

Journal of Electron Microscopy

Volumn 62, Issue 2, 2013, Pages 321-326

  Mitome, Masanori ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Ga2O3; (Zn, Cr)Te; Ar ion milling; low energy ion beam; sample preparation; ultrathin specimen

Indexed keywords

CONTAMINATION; IONS; MILLING (MACHINING); SECONDARY EMISSION; SPECIMEN PREPARATION; TRANSMISSION ELECTRON MICROSCOPY;

AR+ IONS; ENERGY; FOCUSED ION BEAM TECHNIQUE; ION MILLING; LOW ENERGY ION BEAM; LOW-ENERGY AR; MILLING METHODS; SECONDARY ELECTRONS; TRANSMISSION ELECTRON; ULTRA-THIN;

ION BEAMS;

EID: 84876049309     PISSN: 00220744     EISSN: 14779986     Source Type: Journal    
DOI: 10.1093/jmicro/dfs073     Document Type: Article

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