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Journal of Physics D: Applied Physics

Volumn 46, Issue 15, 2013, Pages

Regimes of leakage current in ALD-processed Al2O3 thin-film layers

(6) Spahr, Holger a Reinker, Johannes a Bülow, Tim a Nanova, Diana a Johannes, Hans Hermann a Kowalsky, Wolfgang a

a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BREAKDOWN ELECTRIC FIELD; CHARACTERISTIC CURVE; CURRENT-ELECTRIC FIELDS; ELECTRIC FIELD STRENGTH; POOLE-FRENKEL EFFECT; SPACE CHARGE LIMITED CURRENTS; THIN FILM LAYERS; THIN OXIDE LAYERS;

ELECTRIC FIELDS;

ATOMIC LAYER DEPOSITION;

EID: 84875827625 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/46/15/155302 Document Type: Article

Times cited : (16)

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