SCOPUS 정보 검색 플랫폼

Scripta Materialia

Volumn 68, Issue 9, 2013, Pages 659-662

Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices

(8) Bouhtiyya, S a Lucio Porto, R b Laik B c Boulet, P a Capon, F a Pereira Ramos, J P c Brousse, T b Pierson, J F a

a UNIVERSITÉ DE LORRAINE (France)

b UNIVERSITÉ DE NANTES (France)

c UNIVERSITÉ PARIS EST CRÉTEIL (France)

Author keywords

Electrode material; Reactive sputtering; Ruthenium nitride; Structure

Indexed keywords

CONVERSION REACTIONS; CYCLIC VOLTAMMETRIC; ELECTRODE MATERIAL; GALVANOSTATIC MEASUREMENT; LITHIUM-ION BATTERY; NANOPARTICLE FORMATION; NITRIDE THIN FILMS; PREFERRED ORIENTATIONS;

REACTIVE SPUTTERING; RUTHENIUM; STRUCTURE (COMPOSITION); VIRTUAL STORAGE; ZINC SULFIDE;

NITRIDES;

EID: 84875468582 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/j.scriptamat.2013.01.030 Document Type: Article

Times cited : (89)

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