Microstructure control in TiAlN/SiNx multilayers with appropriate thickness ratios for improvement of hardness and anti-corrosion characteristics

Vacuum

Volumn 87, Issue , 2013, Pages 195-199

  Chan, Yu Chen ^a   Chen, Hsien Wei ^a   Chao, Pen Shen ^a   Duh, Jenq Gong ^a   Lee, Jyh Wei ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Corrosion resistance; Hardness; Microstructure; TiAlN SiNx multilayer

Indexed keywords

AMORPHOUS FILMS; CORROSION; CORROSION PROTECTION; CORROSION RATE; CORROSION RESISTANCE; CRYSTALLINE MATERIALS; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; HARDNESS; MICROSTRUCTURE; POLARIZATION; SILICON NITRIDE; SOLUTIONS;

ANTICORROSION PERFORMANCE; CRYSTALLINE-TO-AMORPHOUS; MICROSTRUCTURE OF FILMS; POLARIZATION IMPEDANCE; POTENTIODYNAMIC POLARIZATION TESTS; REACTIVE MAGNETRON SPUTTERING; SUPER-LATTICE STRUCTURES; TIALN/SIN;

MULTILAYERS;

EID: 84875465279     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.02.052     Document Type: Article

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