Inkjet printing technology for OPV applications

Journal of Imaging Science and Technology

Volumn 56, Issue 4, 2012, Pages

  Ren, Maosheng ^a,b   Sweelssen, Jörgen ^a   Grossiord, Nadia ^a   Gorter, Harrie ^a   Eggenhuisen, Tamara Marijke ^a   Andriessen, Ronn ^a,b  

^a HOLST CENTRE   (Netherlands)

^b Mutracx BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TECHNIQUE; HOMOGENEOUS LAYERS; INK-JET PRINTING TECHNOLOGIES; LARGE-SCALE PRODUCTION; LOSS OF PERFORMANCE; MATERIALS AND PROCESS; ORGANIC PHOTOVOLTAICS; PHOTOACTIVE LAYERS;

COMPETITION; CONDUCTING POLYMERS; DEPOSITION; FUNCTIONAL MATERIALS; TIN OXIDES;

INK JET PRINTING;

EID: 84875418204     PISSN: 10623701     EISSN: 19433522     Source Type: Journal    
DOI: 10.2352/J.ImagingSci.Technol.2012.56.4.040504     Document Type: Article

References (18)

1. P. Kumar and S. Chand, Prog. Photovolt: Res. Appl. 20, 377-415 (2012).
2. G. Li and Y. Yang, Nat. Photon. 6, 153-161 (2012).
3. C. J. Brabec, Sol Energ. Mat. Sol. Cell. 83, 273-292 (2004).
4. Y. Galagan, A. de Vries, R. Langen, W. Andriessen, S. Verhees, and Veenstra J. Kroon, Chem. Eng. Process. 50, 454-461 (2011).
5. F. C. Krebs, M. Jorgensen, K. Norman, O. Hageman, J. Alstrup, T. D. Nielsen, J. Feynbo, K. Larsen, and J. Kristensen, Sol. Energ. Mat. Sol. Cell. 93, 422-441 (2009).
6. M. Singh, H. M. Haverinen, P. Dhagat, and G. E. Jabbour, Adv. Mater. 22, 673 (2010).
7. E. Tekin, P. J. Smith, and U. S. Schubert, Soft. Matter 4, 703-713 (2008).
8. S. H. Eom, S. Senthilarasu, P. Uthirakumar, S. C. Yoon, J. Lim, C. Lee, H. S. Lim, J. Lee, and S. Lee, Org. Electron. 10, 536-542 (2009).
9. C. N. Hoth, S. A. Choulis, P. Schilinsky, and C. J. Brabec, Adv. Mater. 19, 3973-3978 (2007).
10. F. C. Krebs, Sol. Energ. Mat. Sol. Cell. 93, 1636-1641 (2009).
11. Y. Galagan, E. W. C. Coenen, S. Sabik, H. Gorter, M. Barink, S. C. Veenstra, J. M. Kroon, R. Andriessen, and P. W. M. Blom, Sol. Energ. Mat. Sol. Cell. 104, 32-38 (2012).
12. E. Rubingh, P. Kruijt, and R. Andriessen, Proc. LOPE-C, (2009).
13. F. Padinger, R. S. Rittberger, and N. S. Sariciftci, Adv. Funct. Mater. 13, 85-88 (2003).
14. T. Aernouts, G. Aleksandrov, C. Girotto, J. Genoe, and J. Poortmans, Appl. Phys. Lett. 92, 033306 (2008).
15. S. H. Eom, H. Park, S. H. Mujawar, S. C. Yoon, S. Kim, S. Na, S. Kang, D. Khim, D. Kim, and S. Lee, Org. Electron. 11, 1516-1522 (2010).
16. C. N. Hoth, P. Schilinsky, S. A. Choulis, and C. J. Brabec, Nano Lett. 8, 2806-2813 (2008).
17. M. Ren, H. Gorter, J. Michels, and R. Andriessen, J. Imaging Sci. Technol. 55, 040301-1-040301-6 (2011).
18. Y. Galagan, B. Zimmerman, E. W. C. Coenen, M. Jorgensen, D. M. Tanenbaum, F. C. Krebs, H. Gorter, S. Sabik, L. H. Slooff, S. C. Veenstra, J. M. Kroon, and R. Andriessen, Adv. Energy Mater. 2, 103-110 (2001).