The influence of the electrical asymmetry effect on deposition uniformity of thin silicon film

Thin Solid Films

Volumn 532, Issue , 2013, Pages 56-59

  Hrunski, D ^a   Janssen, A ^a   Fritz, T ^a   Hegemann, T ^a   Clark, C ^a   Schreiber, U ^a   Grabosch, G ^a  

^a Leybold Optics GmbH   (Germany)

Author keywords

PECVD; Solar cells; Thin films

Indexed keywords

EXCITATION FREQUENCY; LAYER UNIFORMITY; MATERIAL QUALITY; MULTILAYER STRUCTURES; PLASMA PROPERTIES; TANDEM SOLAR CELLS; THIN SILICON FILMS; THIN SILICON LAYERS;

DEPOSITION RATES; DEPOSITS; FILM PREPARATION; METALLIC FILMS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; THIN FILMS;

SILICON SOLAR CELLS;

EID: 84875226758     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.12.105     Document Type: Article

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