Dark-field microscopic image stitching method for surface defects evaluation of large fine optics

Optics Express

Volumn 21, Issue 5, 2013, Pages 5974-5987

  Liu, Dong ^a   Wang, Shitong ^a   Cao, Pin ^a   Li, Lu ^a   Cheng, Zhongtao ^a   Gao, Xin ^a   Yang, Yongying ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; IMAGE PROCESSING; OPTICS;

FEATURE INFORMATION; FULL APERTURES; IMAGE STITCHING; LARGE APERTURE; MICROSCOPIC IMAGE; MISMATCH PROBLEMS; OVERLAPPING AREA; REGION GROWING;

SURFACE DEFECTS;

EID: 84875184338     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.005974     Document Type: Article

References (16)

1. S. Gomez, K. Hale, J. Burrows, and B. Griffiths, "Measurements of surface defects on optical components," Meas. Sci. Technol. 9(4), 607-616 (1998)
2. H. Ota, M. Hachiya, Y. Ichiyasu, and T. Kurenuma, "Scanning surface inspection system with defect-review SEM and analysis system solutions," Hatachi Review 55, 78-82 (2006)
3. M. Gebhardt, H. Truckenbrodt, and B. Harnisch, "Surface defect detection and classification with light scattering," Proc. SPIE 1500, 135-143 (1991)
4. F. Rainer, R. K. Dickson, R. T. Jennings, J. F. Kimmons, S. M. Maricle, R. P. Mouser, S. Schwartz, and C. L. Weinzapfel, "Development of practical damage mapping and inspection systems," Proc. SPIE 3492, 556-563 (1999)
5. Y. Yang, C. Lu, J. Liang, D. Liu, L. Yang, and R. Li, "Microscopic dark-field scattering imaging and digitalization evaluation system of defects on optical devices precision surface," Guangxue Xuebao/Acta Opt. Sin. 27, 1031-1038 (2007)
6. D. Liu, Y. Y. Yang, L. Wang, Y. M. Zhuo, C. H. Lu, L. M. Yang, and R. J. Li, "Microscopic scattering imaging measurement and digital evaluation system of defects for fine optical surface," Opt. Commun. 278(2), 240-246 (2007)
7. D. Sun, Y. Yang, F. Wang, L. Yang, and R. Li, "Microscopic scattering imaging system of defects on ultrasmooth surface suitable for digital image processing," H. Xun, Y. Jiahu, C. W. James, W. Hexin, and H. Sen, eds. (SPIE, 2006), p. 615012
8. N. Wei, J. You, K. Friehs, E. Flaschel, and T. W. Nattkemper, "In situ dark field microscopy for on-line monitoring of yeast cultures," Biotechnol. Lett. 29(3), 373-378 (2007)
9. K. Rebner, M. Schmitz, B. Boldrini, A. Kienle, D. Oelkrug, and R. W. Kessler, "Dark-field scattering microscopy for spectral characterization of polystyrene aggregates," Opt. Express 18(3), 3116-3127 (2010)
10. S. Muramatsu, Y. Kobayashi, K. Takahashi, and E. Shimizu, "Development of template matching hardware and its high-speed processing strategy," Electron. Commun. Jpn. Part III Fundam. Electron. Sci. 84(11), 1-10 (2001)
11. M. Ghodsi, M. Hajiaghayi, M. Mahdian, and V. Mirrokni, "Length-constrained path-matchings in graphs," Networks 39(4), 210-215 (2002)
12. J. Cohen, P. Fraigniaud, J. Konig, and A. Raspaud, "Optimized broadcasting and multicasting protocols in cutthrough routed networks," IEEE Trans. Parallel Distrib. Syst. 9(8), 788-802 (1998)
13. A. Mehnert and P. Jackway, "An improved seeded region growing algorithm," Pattern Recognit. Lett. 18(10), 1065-1071 (1997)
14. D. Chaudhuri and A. Samal, "A simple method for fitting of bounding rectangle to closed regions," Pattern Recognit. 40(7), 1981-1989 (2007)
15. M. Stepanova, S. Dew, M. Mohammad, M. Muhammad, and S. Dew, "Fundamentals of electron beam exposure and development," in Nanofabrication (Springer, 2012), pp. 11-41
16. V. Y. Guzhov, "Ion-beam etching technology in the production of optical elements," J. Opt. Technol. 69(9), 685 (2002)