Ion-beam etching technology in the production of optical elements

Journal of Optical Technology (A Translation of Opticheskii Zhurnal)

Volumn 69, Issue 9, 2002, Pages 685-687

  Guzhov, V Yu ^a  

^a OAO LOMO   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DIFFRACTION GRATINGS; ETCHING; HOLOGRAPHIC OPTICAL ELEMENTS; ION BEAMS; ION SOURCES; LASERS; MASKS; MICROOPTICS; OPTICAL SHUTTERS; PHOTORESISTS; SURFACE ROUGHNESS;

ASYMMETRIZATION; HOLOGRAPHIC DIFFRACTION GRATINGS; ION BEAM ETCHING; KINOFORM OPTICAL ELEMENT; LASER SHUTTER; OPTICAL ELEMENT FABRICATION; SURFACE MICRORELIEF;

OPTOELECTRONIC DEVICES;

EID: 0036758138     PISSN: 10709762     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOT.69.000685     Document Type: Article

References (5)

1. G. F. Ivanovskiǐ and V. I. Petrov, Ion-Plasma Processing of Materials (Radio i Svyaz', Moscow, 1986).
2. R. A. Mikhnev, S. K. Shtandel', M. I. Martynov, and L. A. Elesin, "How ion-beam etching the surface of optical articles affects the chemical composition of optical materials," Opt. Zh. 66, No. 12, 24 (1999) [J. Opt. Technol. 66, 1029 (1999)].
3. H. Nagata and M. Kisi, "Production of blazed holographic gratings by a simple optical system," Jpn. J. Appl. Phys. 14, 1556 (1975).
4. L. F. Johnson, "Evolution of grating profiles under ion-beam erosion," Appl. Opt. 18, 2559 (1979).
5. 2 blazed holographic grating by reactive ion etching," Jpn. J. Appl. Opt. 19, 1126 (1980).