Double-pattern textured ZnO:Ga thin films fabricated by an APPJ and an DC sputtering

ECS Solid State Letters

Volumn 1, Issue 3, 2012, Pages

  Yu, Shu Hung ^a   Ho, Po Ching ^a   Yang, Teng Wei ^a   Bi, Chien Chung ^b   Yeh, Chih Hung ^b   Chang, Chun Yen ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NexPower Technology Corporation   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; DC SPUTTERING; ELECTRO-OPTICAL CHARACTERISTICS; FILM QUALITY; GALLIUMDOPED ZINC OXIDES (GZO); GLASS SUBSTRATES; HALL MEASUREMENTS; ORGANOSILICONES;

SUBSTRATES; ZINC OXIDE;

GALLIUM;

EID: 84875140420     PISSN: 21628742     EISSN: 21628750     Source Type: Journal    
DOI: 10.1149/2.003203ssl     Document Type: Article

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