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Volumn 611, Issue , 2013, Pages 86-93

Surface structure of nickel oxide layers on a Rh(111) surface

(8) Gragnaniello, L a,b Allegretti, F a,c Zhan, R R d,e Vesselli, E d,e Baraldi, A d,e Comelli, G d,e Surnev, S a Netzer, F P a

a UNIVERSITY OF GRAZ (Austria)

b EPFL (Switzerland)

c TECHNICAL UNIVERSITY OF MUNICH (Germany)

d UNIVERSITY OF TRIESTE (Italy)

e LABORATORIO TASC (Italy)

Author keywords

Nickel oxide; Rh(111); STM; XPD

Indexed keywords

HIGH-RESOLUTION ELECTRON ENERGY LOSS SPECTROSCOPY; OXYGEN PRESSURE; RELAXATION MECHANISM; RH (111) SURFACE; RH(111); STM; X RAY PHOTO-ELECTRON DIFFRACTION; XPD;

ELECTRON ENERGY LOSS SPECTROSCOPY; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; NICKEL OXIDE; OXYGEN; PHOTOELECTRONS; RHODIUM; SCANNING TUNNELING MICROSCOPY; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

NICKEL;

EID: 84874938601 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2013.01.018 Document Type: Article

Times cited : (19)

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