Copper and iron based thin film nanocomposites prepared by radio frequency sputtering. Part I: Elaboration and characterization of metal/oxide thin film nanocomposites using controlled in situ reduction process

Journal of Materials Science

Volumn 48, Issue 9, 2013, Pages 3386-3394

  Barnabe A ^a   Chapelle, A ^a   Presmanes, L ^a   Tailhades, P ^a  

^a UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER IONS; COPPER NANOPARTICLES; DELAFOSSITE CUFEO; DIFFERENT PROPORTIONS; EMPIRICAL RELATIONSHIPS; GLASS SUBSTRATES; GRAZING INCIDENCE X-RAY DIFFRACTION; IRON-BASED; NANOCOMPOSITE THIN FILMS; OVERALL REACTIONS; OXIDE MATRIX; RADIO FREQUENCY SPUTTERING; SITU REDUCTION; SPUTTERING GAS PRESSURE; SPUTTERING PARAMETERS; STRUCTURE AND MICROSTRUCTURES; TARGET TO SUBSTRATE DISTANCE; THIN-FILM NANOCOMPOSITES;

COPPER; COPPER COMPOUNDS; FILM PREPARATION; IRON OXIDES; METAL IONS; NANOCOMPOSITE FILMS; NANOCOMPOSITES; OXIDE FILMS; RAMAN SPECTROSCOPY; REDUCTION; SPUTTERING; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION;

PROCESS CONTROL;

EID: 84874753750     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-012-7123-6     Document Type: Article

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