In-situ Raman monitoring of stress evaluation and reaction in Cu 2O oxide layer

Materials Letters

Volumn 78, Issue , 2012, Pages 11-13

  Zheng, Yao Ting ^a   Xuan, Fu Zhen ^a   Wang, Zhengdong ^a  

^a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Nano island; Oxidation; Raman; Stress generation and relaxation

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPE (AFM); CU FILMS; EX SITU; GROWTH MODELS; GROWTH STRESS; IN-SITU; NANO-ISLANDS; NANO-OXIDES; OXIDATION KINETICS; OXIDE LAYER; OXIDE LAYER GROWTH; OXIDE SURFACE; OXYGEN REACTION; RAMAN; RAMAN DATA; RAMAN MEASUREMENTS; RAMAN MONITORING; STRESS EVALUATIONS; STRESS EVOLUTION; STRESS GENERATION;

ATOMIC FORCE MICROSCOPY; METALLIC FILMS; OXIDATION;

OXYGEN;

EID: 84861609847     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2012.03.015     Document Type: Article

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