Carbon nanotube growth activated by quantum-confined silicon nanocrystals

Journal of Physics D: Applied Physics

Volumn 46, Issue 12, 2013, Pages

  Mariotti, D ^a   Svrcek V ^b   Mathur, A ^a   Dickinson, C ^c   Matsubara, K ^b   Kondo, M ^b  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBE GROWTH; EXPOSED TO; LASER FRAGMENTATION; LOW PRESSURE PLASMA; METAL CATALYST; MULTI-WALLED CNTS; NUCLEATION AND GROWTH; PLASMA PROCESS; SILICON NANOCRYSTALS; SPHERICAL PARTICLE; SURFACE CHARACTERISTICS; SURFACE FEATURE;

CARBON NANOTUBES; ELECTROCHEMICAL ETCHING; PLASMA APPLICATIONS;

SILICON;

EID: 84874535838     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/12/122001     Document Type: Article

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