Cathodic deposition of TiO2: Effects of H2O 2 and deposition modes

Journal of the Electrochemical Society

Volumn 159, Issue 7, 2012, Pages

  Hu, Chi Chang ^a   Hsu, Huan Ching ^a   Chang, Kuo Hsin ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODIC DEPOSITION; CRYSTALLINE STRUCTURE; DEPOSITION METHODS; DEPOSITION SOLUTION; DEPOSITION VARIABLES; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE; PLATING SOLUTIONS; POROUS MORPHOLOGY;

DEPOSITS; SURFACE MORPHOLOGY;

TITANIUM DIOXIDE;

EID: 84874395915     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.026207jes     Document Type: Article

References (47)

1. A. Fujishima, T. N. Rao, and D. A. Tryk, Electrochim. Acta, 45, 4683 (2000).
2. A. L. Linsebigler, G. Q. Lu, and J. T. Yates, Chem. Rev., 95, 735 (1995).
3. X. Chen and S. S. Mao, Chem. Rev., 107, 2891 (2007).
4. B. Oregan and M. Gratzel, Nature, 353, 737 (1991).
5. A. Hagfeldt and M. Gratzel, Acc. Chem. Res., 33, 269 (2000).
6. D. Li and Y. N. Xia, Nano Lett., 3, 555 (2003).
7. D. Gong, C. A. Grimes, O. K. Varghese, W. Hu, R. S. Singh, Z. Chen, and E. C. Dickey, J. Mater. Res., 16, 3331 (2001).
8. J. M. Macák, H. Tsuchiya, A. Ghicov, and P. Schmuki, Electrochem. Commun., 7, 1133 (2005).
9. K. Wessels, M. Minnermann, J. Rathousky, M. Wark, and T. Oekermann, J. Phys. Chem. C, 112, 15122 (2008).
10. L. Kavan, B. O'Regan, A. Kay, and M. Gratzel, J. Electroanal. Chem., 346, 291 (1993).
11. K. Wessels, A. Feldhoff, M. Wark, J. Rathousky, and T. Oekermann, Electrochem. Solid-State Lett., 9, C93 (2006).
12. C. Natarajan and G. Nogami, J. Electrochem. Soc., 143, 1547 (1996).
13. G. Zotti, G. Schiavon, and S. Zecchin, J. Electrochem. Soc., 146, 637 (1999).
14. K. Kamada, M. Mukai, and Y. Matsumoto, Electrochim. Acta, 47, 3309 (2002).
15. S. Karuppuchamy, K. Nonomura, T. Yoshida, T. Sugiura, and H. Minoura, Solid State ionics, 151, 19 (2002).
16. A. M. Peiro, E. Brillas, J. Peral, X. Domenech, and J. A. Ayllon, J. Mater. Chem., 12, 2769 (2002).
17. C. D. Lokhande, S. K. Min, K. D. Jung, and O. S. Joo, J. Mater. Sci., 39, 6607 (2004).
18. I. Zhitomirsky and L. GalOr, J. Euro. Ceram. Soc., 16, 819 (1996).
19. S. A. Kumar, P. H. Lo, and S. M. Chen, Nanotechnol., 19, 255501 (2008).
20. D. M. Macarthur, J. Electrochem. Soc., 117, 422 (1970).
21. V. Gupta, T. Kusahara, H. Toyama, S. Supta, and N. Miura, Electrochem. Commun., 9, 2315 (2007).
22. M. Izaki and T. Omi, Appl. Phys. Lett., 68, 2439 (1996).
23. L. Xu, Y. Guo, Q. Liao, J. Zhang, and D. Xu, J. Phys. Chem. B, 109, 13519 (2005).
24. A. Goux, T. Pauporté, J. Chivot, and D. Lincot, Electrochim. Acta, 50, 2239 (2005).
25. Y. Ishikawa and Y. Matsumoto, Electrochim. Acta, 46, 2819 (2001).
26. S. Karuppuchamy, D. P. Amalnerkar, K. Yamaguchi, T. Yoshida, T. Sugiura, and H. Minoura, Chem. Lett., 1, 78 (2001).
27. S. T. Chang, I. C. Leu, and M. H. Hon, J. Crys. Grow., 273, 195 (2004).
28. C. C. Huang, H. C. Hsu, C. C. Hu, K. H. Chang, and Y. F. Lee, Electrochim. Acta, 55, 7028 (2010).
29. C. C. Hu, C. C. Huang, and K. H. Chang, Electrochem. Commun., 11, 434 (2009).
30. I. Zhitomirsky, J. Euro. Ceram. Soc., 19, 2581 (1999).
31. B. Xue, R. Liu, and Z. D. Xu, Mater. Lett., 63, 2377 (2009).
32. I. Zhitomirsky, Nanostructured Mater., 8, 521 (1997).
33. P. Tengvall, I. Lundström, L. Sjöqvist, H. Elwing, and L. M. Bjursten, Biomater., 10, 166 (1989).
34. J. Ragai, Nature, 325, 703 (1987).
35. Y. S. Chiang, J. Craddock, D. Mickewich, and J. Turkevich, J. Phys. Chem., 70, 3509 (1966).
36. R. M. G. de Lima, W. G. R. da Silva, J. W. da Cunha, and J. C. Afonso, J. Hazard. Mater., 161, 1560 (2009).
37. S. Trasatti, Electrochim. Acta, 45, 2377 (2000).
38. J. C. Forti, P. Olivi, and A. R. de Andrade, Electrochim. Acta, 47, 913 (2001).
39. T. C. Wen and C. C. Hu, J. Electrochem. Soc., 139, 2158 (1992).
40. M. R. Grace and L. Spiccia, inorg. Chim. Acta, 213, 103 (1993).
41. I. Zhitomirsky, Mater. Lett., 33, 305 (1998).
42. C.-M. Lin and S.-K. Yen, J. Electrochem. Soc., 151, D127 (2004).
43. C. Kollia, N. Spyrellis, J. Amblard, M. Froment, and G. Maurin, J. Appl. Electrochem., 20, 1025 (1990).
44. N. Ibl, J. C. Puippe, and H. Angerer, Surf. Technol., 6, 287 (1978).
45. Y. D. Tsai and C. C. Hu, J. Electrochem. Soc., 158, D482 (2011).
46. Y. D. Tsai, C. Y. Yu, C. C. Hu, and J. G. Duh, J. Electrochem. Soc., 159, D108 (2012).
47. K. H. Choi, H. S. Kim, and T. H. Lee, J. Power Sources, 75, 230 (1998).