Cathodic electrodeposition of nanocrystalline titanium dioxide thin films

Journal of the Electrochemical Society

Volumn 143, Issue 5, 1996, Pages 1547-1550

  Natarajan, C ^a   Nogami, G ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BLEACHING; CONDUCTIVE MATERIALS; ELECTRODEPOSITION; GLASS; HEAT TREATMENT; IONS; LITHIUM; NANOSTRUCTURED MATERIALS; TITANIUM DIOXIDE;

CATHODIC ELECTRODEPOSITION; COLORATION; GEL FILM;

THIN FILMS;

EID: 0030145443     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836677     Document Type: Article

References (12)

1. B. O'Regan and M. Gratzel, Nature, 353, 737 (1991).
2. (a) A. Hagfeldt, N. Vlachopoulos, and M.Gratzel, This Journal, 141, L82 (1994);
3. (b) A. Gutarra, A. Azens, B. Stierna, C. G. Granqvist, Appl. Phys. Lett., 64, 1604 (1994).
4. K. Vinodgopal, S. Hotchandani, and P. V. Kamat, J. Phys. Chem., 97, 9040 (1993).
5. M. K. Nazeeruddin, A. Kay, I. Rodicio, R. HumphryBaker, E. Muller, P. Liska, N. Vlachopoulos, and M. Gratzel, J. Am. Chem. Soc., 115, 6382 (1993).
6. D. Matthews, A. Kay, and M. Gratzel, Aust. J. Chem., 47, 1869 (1994), and reference therein.
7. L. Kavan, B. O'Regan, A. Kay, and M. Gratzel, J. Electroanal. Chem., 346, 291 (1993).
8. (a) H. Konno, M. Tokita, and R. Fruichi, This Journal, 137, 825 (1990);
9. (b) P. M. S. Monk, S. L. Chester, D. S. Highann, and R. D. Partridge, Electrochim. Acta., 39, 2277 (1994).
10. P. Comba and A. Merbach, Inorg. Chem., 26, 1315 (1987).
11. A. Henglein, Top. Curr. Chem., 143, 115 (1988).
12. F Cao, G. Oskam, P. C. Searson, J. M. Stipkala, T. A. Heimer, F. Farzad, and G. J. Meyer, J. Phys. Chem., 99, 11974 (1995).