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Volumn 74, Issue 4, 2013, Pages 599-604

Doping level influence on chemical surface of diamond electrodes

Author keywords

A. Semiconductors; C. Raman spectroscopy; D. Electrochemical properties; D. Surface properties

Indexed keywords

BORON-DOPED DIAMOND FILMS; CHEMICAL SURFACES; DIAMOND ELECTRODE; DIAMOND MORPHOLOGY; DOPING LEVELS; ELECTROCHEMICAL RESPONSE; FILM SURFACES; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; MOTT-SCHOTTKY PLOTS; POTENTIAL WINDOWS; RAMAN SCATTERING SPECTROSCOPY; SURFACE BONDS; SYNCHROTRON X-RAY PHOTOELECTRON SPECTROSCOPIES;

EID: 84874110359     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2012.12.013     Document Type: Article
Times cited : (39)

References (33)
  • 33
    • 84874115532 scopus 로고    scopus 로고
    • Dissertation Abstracts International, The Chinese University of Hong Kong 60-09, section: B, page: 4631
    • K.W. Wong, Negative Electron Affinity and Modifications of Diamond Surfaces, Dissertation Abstracts International, The Chinese University of Hong Kong, 1999, isbn:9780599475595; vol. 60-09, section: B, page: 4631; 119 pp.
    • (1999) Negative Electron Affinity and Modifications of Diamond Surfaces , pp. 119
    • Wong, K.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.