Field emission characteristic studies of chemical vapor deposited diamond films

Solid-State Electronics

Volumn 44, Issue 10, 2000, Pages 1733-1741

  Chen, Chi Lin ^a   Chen, Chau Shu ^a   Lue, Juh Tzeng ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; DIAMOND FILMS; HYDROGENATION;

FOWLER-NORDHEIM EQUATIONS; NEGATIVE ELECTRON AFFINITY (NEA) SURFACES;

FIELD EMISSION CATHODES;

EID: 0034291968     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(00)00139-8     Document Type: Article

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