Atomically flat interface between a single-terminated LaAlO3 substrate and SrTiO3 thin film is insulating

AIP Advances

Volumn 2, Issue 1, 2012, Pages

  Liu, Z Q ^a   Huang, Z ^a   Lu W M ^a   Gopinadhan, K ^a   Wang, X ^a   Annadi, A ^a   Venkatesan, T ^a   Ariando, ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; FILM GROWTH; OXIDE MINERALS; PHASE INTERFACES; STRONTIUM TITANATES; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; TWO DIMENSIONAL ELECTRON GAS;

ATOMICALLY FLAT FILMS; ATOMICALLY FLAT INTERFACES; ATOMICALLY FLAT SURFACE; LAO SUBSTRATE; MIRROR STRUCTURE; SRTIO3 THIN FILMS; SURFACE TERMINATION; TWO-DIMENSIONAL ELECTRON GAS (2DEG);

LANTHANUM COMPOUNDS;

EID: 84874102709     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.3688772     Document Type: Article

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