Patterning polymer-fullerene nanocomposite thin films with light

Advanced Materials

Volumn 25, Issue 7, 2013, Pages 985-991

  Wong, Him Cheng ^a   Higgins, Anthony M ^b   Wildes, Andrew R ^c   Douglas, Jack F ^d   Cabral, João T ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b SWANSEA UNIVERSITY   (United Kingdom)

^c INSTITUT LAUE LANGEVIN   (France)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Dewetting Suppression; Fullerene; Light; Nanocomposites; Patterning; Polymers; Self assembly; Thin Films

Indexed keywords

AMBIENT CONDITIONS; DE-WETTING; DIRECTED ASSEMBLY; LENGTH SCALE; NANOCOMPOSITE THIN FILMS; PATTERNING; PHASE SEPARATED MORPHOLOGY; PHOTO PATTERNING; POLYMER-FULLERENE; SELF-ORGANIZATION PROCESS; THERMAL-ANNEALING;

LIGHT; NANOCOMPOSITE FILMS; NANOCOMPOSITES; POLYMER FILMS; POLYMERS; SELF ASSEMBLY; THIN FILMS;

FULLERENES;

FULLERENE DERIVATIVE; NANOCOMPOSITE; POLYMER; SILICON;

ARTICLE; CHEMISTRY; OXIDATION REDUCTION REACTION; ULTRAVIOLET RADIATION;

FULLERENES; NANOCOMPOSITES; OXIDATION-REDUCTION; POLYMERS; SILICON; ULTRAVIOLET RAYS;

EID: 84874033670     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201203541     Document Type: Article

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