Fundamental studies of electrochemically controlled surface oxidation and hydrophobicity of natural enargite

Langmuir

Volumn 29, Issue 7, 2013, Pages 2371-2386

  Plackowski, Chris ^a   Hampton, Marc A ^a   Nguyen, Anh V ^a   Bruckard, Warren J ^b  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AFM IMAGING; COMPETING EFFECTS; CONTROLLED OXIDATIONS; COPPER HYDROXIDE; COPPER SULFATE; DIFFUSION LIMITED; DROPLET EVAPORATION; ELECTROCHEMICAL CONTROL; ELECTROCHEMICAL TECHNIQUES; ELEMENTAL SULFUR; ENARGITE; EX SITU; EXPERIMENTAL APPROACHES; FUNDAMENTAL STUDIES; HETEROGENEOUS DISTRIBUTIONS; MINERAL SURFACES; OXIDIZING CONDITIONS; POLISHED SURFACES; RMS ROUGHNESS; ROOT MEAN SQUARE ROUGHNESS; SIGNIFICANT DIFFERENCES; SURFACE LAYERS; SURFACE OXIDATIONS; SURFACE PRODUCTS; SURFACE SPECIATION; SURFACE SPECIES;

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; COPPER; HYDROPHOBICITY; PHOTOELECTRONS; SULFUR; SURFACE ANALYSIS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDATION;

ARTICLE; CHEMICAL PHENOMENA; ELECTROCHEMISTRY; METHODOLOGY; OXIDATION REDUCTION REACTION; SURFACE PROPERTY;

ELECTROCHEMISTRY; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; OXIDATION-REDUCTION; SURFACE PROPERTIES;

EID: 84874024177     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la3043654     Document Type: Article

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