-
3
-
-
0036575189
-
-
10.1088/0963-0252/11/2/301
-
N. Dumitrascu, G. Borcia, N. Apetroaei, and G. Popa, Plasma Sources Sci. Technol. 11, 127 (2002). 10.1088/0963-0252/11/2/301
-
(2002)
Plasma Sources Sci. Technol.
, vol.11
, pp. 127
-
-
Dumitrascu, N.1
Borcia, G.2
Apetroaei, N.3
Popa, G.4
-
5
-
-
79955409473
-
-
10.1063/1.3582923
-
D. Wang, D. Zhao, K. Feng, X. Zhang, D. Liu, and S. Yang, Appl. Phys. Lett. 98, 161501 (2011). 10.1063/1.3582923
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 161501
-
-
Wang, D.1
Zhao, D.2
Feng, K.3
Zhang, X.4
Liu, D.5
Yang, S.6
-
7
-
-
0032025605
-
-
10.1016/S0040-6090(98)00395-2
-
T. Mori, K. Tanaka, T., Inomata, A. Takeda, and M. Kogoma, Thin Solid Films 316, 89 (1998). 10.1016/S0040-6090(98)00395-2
-
(1998)
Thin Solid Films
, vol.316
, pp. 89
-
-
Mori, T.1
Tanaka, K.2
Inomata, T.3
Takeda, A.4
Kogoma, M.5
-
9
-
-
0038209293
-
-
10.1080/713610667
-
H. Ma and Y. Qiu, Ozone: Sci. Eng. 25, 127 (2003). 10.1080/713610667
-
(2003)
Ozone: Sci. Eng.
, vol.25
, pp. 127
-
-
Ma, H.1
Qiu, Y.2
-
10
-
-
70350469995
-
-
10.1088/0022-3727/42/8/085204
-
Z. Fang, X. Xie, J. Li, H. Yang, Y. Qiu, and E. Kuffel, J. Phys. D: Appl. Phys. 42, 085204 (2009). 10.1088/0022-3727/42/8/085204
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 085204
-
-
Fang, Z.1
Xie, X.2
Li, J.3
Yang, H.4
Qiu, Y.5
Kuffel, E.6
-
11
-
-
77956252002
-
-
10.1002/ppa200900175
-
P. Rajasekaran, P. Mertmann, N. Bibinov, D. Wandke, W. Viol, and P. Awakowicz, Plasma Processes Polym. 7, 665 (2010). 10.1002/ppap.200900175
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 665
-
-
Rajasekaran, P.1
Mertmann, P.2
Bibinov, N.3
Wandke, D.4
Viol, W.5
Awakowicz, P.6
-
12
-
-
14544308502
-
-
10.1088/0022-3727/38/4/007
-
J. R. Roth, J. Rahel, X. Dai, and D. M. Sherman, J. Phys. D: Appl. Phys. 38, 555 (2005). 10.1088/0022-3727/38/4/007
-
(2005)
J. Phys. D: Appl. Phys.
, vol.38
, pp. 555
-
-
Roth, J.R.1
Rahel, J.2
Dai, X.3
Sherman, D.M.4
-
13
-
-
84899927019
-
-
10.1088/0022-3727/21/5/028.
-
S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D: Appl. Phys. 21, 838 (1988) 10.1088/0022-3727/21/5/028.
-
(1988)
J. Phys. D: Appl. Phys.
, vol.21
, pp. 838
-
-
Kanazawa, S.1
Kogoma, M.2
Moriwaki, T.3
Okazaki, S.4
-
14
-
-
0034247479
-
-
10.1088/0963-0252/9/3/312
-
N. Gherardi, G. Gouda, E. Gat, A. Ricard, and F. Massines, Plasma Sources Sci. Technol. 9, 340 (2000). 10.1088/0963-0252/9/3/312
-
(2000)
Plasma Sources Sci. Technol.
, vol.9
, pp. 340
-
-
Gherardi, N.1
Gouda, G.2
Gat, E.3
Ricard, A.4
Massines, F.5
-
15
-
-
14544290686
-
-
10.1088/0022-3727/38/4/003
-
K. Kozlov, R. Brandenburg, H. Wagner, A. M. Morozov, and P. Michel, J. Phys. D: Appl. Phys. 38, 518 (2005). 10.1088/0022-3727/38/4/003
-
(2005)
J. Phys. D: Appl. Phys.
, vol.38
, pp. 518
-
-
Kozlov, K.1
Brandenburg, R.2
Wagner, H.3
Morozov, A.M.4
Michel, P.5
-
16
-
-
0032022902
-
-
10.1063/1.367051
-
F. Massines, A. Rabehi, P. Decomps, R. B. Gadri, P. Segur, and C. Mayoux, J. Appl. Phys. 83, 2950 (1998). 10.1063/1.367051
-
(1998)
J. Appl. Phys.
, vol.83
, pp. 2950
-
-
Massines, F.1
Rabehi, A.2
Decomps, P.3
Gadri, R.B.4
Segur, P.5
Mayoux, C.6
-
17
-
-
79960607699
-
-
10.1063/1.3599845
-
Q. Li, H. Takana, Y. Pu, and H. Nishiyama, Appl. Phys. Lett. 98, 241501 (2011). 10.1063/1.3599845
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 241501
-
-
Li, Q.1
Takana, H.2
Pu, Y.3
Nishiyama, H.4
-
18
-
-
0025474980
-
-
10.1088/0022-3727/23/8/021
-
T. Yokoyama, M. Kogoma, T. Moriwaki, and S. Okazakit, J. Phys. D: Appl. Phys. 23, 1125 (1990). 10.1088/0022-3727/23/8/021
-
(1990)
J. Phys. D: Appl. Phys.
, vol.23
, pp. 1125
-
-
Yokoyama, T.1
Kogoma, M.2
Moriwaki, T.3
Okazakit, S.4
-
20
-
-
84859550645
-
-
10.1063/1.3698135
-
Q. Li, H. Takana, Y. Pu, and H. Nishiyama, Appl. Phys. Lett. 100, 133501 (2012). 10.1063/1.3698135
-
(2012)
Appl. Phys. Lett.
, vol.100
, pp. 133501
-
-
Li, Q.1
Takana, H.2
Pu, Y.3
Nishiyama, H.4
-
21
-
-
33745450143
-
-
10.1103/PhysRevLett.96.255001
-
L. Stollenwerk, S. Amiranashvili, J.-P. Boeuf, and H. Purwins, Phys. Rev. Lett. 96, 255001 (2006). 10.1103/PhysRevLett.96.255001
-
(2006)
Phys. Rev. Lett.
, vol.96
, pp. 255001
-
-
Stollenwerk, L.1
Amiranashvili, S.2
Boeuf, J.-P.3
Purwins, H.4
-
25
-
-
0028731648
-
-
in, Santa Fe, NM, 6-8 June (IEEE, 1994), DOI: 10.1109/PLASMA.1994.588751.
-
P. Spence and J. Roth, in Proceedings of the 21st IEEE International Conference on Plasma Science, Santa Fe, NM, 6-8 June 1994 (IEEE, 1994), p. 97, DOI: 10.1109/PLASMA.1994.588751.
-
(1994)
Proceedings of the 21st IEEE International Conference on Plasma Science
, pp. 97
-
-
Spence, P.1
Roth, J.2
-
26
-
-
0034197092
-
-
10.1023/A:1009531831404
-
S. F. Miralai, E. Monette, R. Bartnikas, R. Czeremuszkin, V. Latreche, and M. R. Wertheimer, Plasmas Polym. 5, 63 (2000). 10.1023/A:1009531831404
-
(2000)
Plasmas Polym.
, vol.5
, pp. 63
-
-
Miralai, S.F.1
Monette, E.2
Bartnikas, R.3
Czeremuszkin, R.4
Latreche, V.5
Wertheimer, M.R.6
-
27
-
-
84863308149
-
-
10.1063/1.4729818
-
J. Tang, S. Li, W. Zhao, Y. Wang, and Y. Duan, Appl. Phys. Lett. 100, 253505 (2012). 10.1063/1.4729818
-
(2012)
Appl. Phys. Lett.
, vol.100
, pp. 253505
-
-
Tang, J.1
Li, S.2
Zhao, W.3
Wang, Y.4
Duan, Y.5
-
28
-
-
36549041386
-
-
10.1063/1.2819073
-
H. Y. Luo, Z. Liang, B. Lv, X. X. Wang, Z. C. Guan, and L. M. Wang, Appl. Phys. Lett. 91, 221504 (2007). 10.1063/1.2819073
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 221504
-
-
Luo, H.Y.1
Liang, Z.2
Lv, B.3
Wang, X.X.4
Guan, Z.C.5
Wang, L.M.6
-
31
-
-
0003839414
-
-
2nd ed. (Springer, Berlin, Germany).
-
Y. P. Raizer, Gas Discharge Physics, 2nd ed. (Springer, Berlin, Germany, 1991).
-
(1991)
Gas Discharge Physics
-
-
Raizer, Y.P.1
-
32
-
-
77950563331
-
-
10.1063/1.3360932
-
Y. Xian, X. Lu, Z. Tang, Q. Xiong, W. Gong, D. Liu, Z. Jiang, and Y. Pan, J. Appl. Phys. 107, 063308 (2010). 10.1063/1.3360932
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 063308
-
-
Xian, Y.1
Lu, X.2
Tang, Z.3
Xiong, Q.4
Gong, W.5
Liu, D.6
Jiang, Z.7
Pan, Y.8
-
33
-
-
78249271030
-
-
10.1088/0022-3727/43/41/415201
-
Q. Xiong, A. Nikiforov, X. Lu, and C. Leys, J. Phys. D: Appl. Phys. 43, 415201 (2010). 10.1088/0022-3727/43/41/415201
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, pp. 415201
-
-
Xiong, Q.1
Nikiforov, A.2
Lu, X.3
Leys, C.4
-
34
-
-
9944239352
-
-
10.1088/0963-0252/13/4/011
-
A. Chirokov, A. Gutsol, A. Fridman, K. D. Sieber, J. M. Grace, and K. S. Robinson, Plasma Sources Sci. Technol. 13, 623 (2004). 10.1088/0963-0252/13/4/ 011
-
(2004)
Plasma Sources Sci. Technol.
, vol.13
, pp. 623
-
-
Chirokov, A.1
Gutsol, A.2
Fridman, A.3
Sieber, K.D.4
Grace, J.M.5
Robinson, K.S.6
-
35
-
-
84859207465
-
-
10.1063/1.3672511
-
J. Tang, W. Cao, W. Zhao, Y. Wang, and Y. Duan, Phys. Plasmas 19, 013501 (2012). 10.1063/1.3672511
-
(2012)
Phys. Plasmas
, vol.19
, pp. 013501
-
-
Tang, J.1
Cao, W.2
Zhao, W.3
Wang, Y.4
Duan, Y.5
-
37
-
-
42349085395
-
-
10.1063/1.2912524
-
X. Lu, Z. Jiang, Q. Xiong, Z. Tang, and Y. Pan, Appl. Phys. Lett. 92, 151504 (2008). 10.1063/1.2912524
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 151504
-
-
Lu, X.1
Jiang, Z.2
Xiong, Q.3
Tang, Z.4
Pan, Y.5
|