Filamentary and homogeneous modes of dielectric barrier discharge (DBD) in air: Investigation through plasma characterization and simulation of surface irradiation

Plasma Processes and Polymers

Volumn 7, Issue 8, 2010, Pages 665-675

  Rajasekaran, Priyadarshini ^a   Mertmann, Philipp ^a   Bibinov, Nikita ^a   Wandke, Dirk ^b   Viöl, Wolfgang ^c,d   Awakowicz, Peter ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b CINOGY GMBH   (Germany)

^c UNIVERSITY OF APPLIED SCIENCES AND ARTS   (Germany)

^d LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

Barrier; Dielectric barrier discharges (DBD); Electronenergy distribution function(EEDF); Optical emission spectroscopy (OES); Ozone; Plasma treatment; Surfaces

Indexed keywords

BARRIER; DIELECTRIC BARRIER DISCHARGES; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; OPTICAL EMISSIONS; PLASMA TREATMENT;

DIELECTRIC DEVICES; DISCHARGE (FLUID MECHANICS); DISTRIBUTION FUNCTIONS; ELECTRODES; ELECTRON ENERGY ANALYZERS; EMISSION SPECTROSCOPY; FLOW CONTROL; LIGHT EMISSION; NITRIC OXIDE; OPTICAL EMISSION SPECTROSCOPY; OZONE; PHOTOGRAPHY; PHOTONS; PLASMA APPLICATIONS; PLASMAS;

ELECTRIC DISCHARGES;

EID: 77956252002     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900175     Document Type: Article

References (44)

1. M. Xi, Y.-L. Li, S. Shang, D.-H. Li, Y.-X. Yin, X.-Y. Dai, Surf. Coat. Technol 2008, 202, 6029.
2. L. Wei, T. Xiaodong, L. Dongping, L. Yanhong, F. Zhiqing, C. Baoxiang, Plasma Sci. Technol 2008, 10, 74.
3. F. Massines, N. Gherardi, F. Sommer, Plasmas Polym. 2000, 5, 151.
4. G.-M. Xu, Y. Ma, G.-J. Zhang, IEEE Trans. Plasma Sci. 2008, 36, 1352.
5. Z. Navrátil, R. Brandenburg, D. Trunec, A. Brablec, P. Stáhel, H.-E. Wagner, Z. Kopecky, Plasma Sources Sci. Technol. 2006, 15, 8.
6. P. Awakowicz, N. Bibinov, M. Born, B. Busse, R. Gesche, A. Helmke, A. Kaemling, V. Kolb-Bachofen, R. Kovacs, S. Kuehn, J. Liebmann, N. Mertens, U. Niemann, C. Oplaender, H.-E. Porteanu, J. Scherer, C. Suschek, W. Vioel, D. Wandke, Plasma Phys. 2009, 49, 641.
7. X. Guimin, Z. Guanjun, S. Xingmin, M. Yue, W. Ning, Y. Li, Plasma Sci. Technol. 2009, 11, 83.
8. Z. Fang, X. Xie, J. Li, H. Yang, Y. Qiu, E. Kuffel, J. Phys. D: Appl. Phys. 2009, 42, 085204.
9. Z. Rymuza, M. Misiak, Z. Rzanek-Boroch, K. Schmidt-Szaowski, J. Janowska, Thin Solid Films 2004, 466, 158.
10. S. Kanasawa, M. Kogoma, T. Moriwaki, S. Okazaki, J. Phys. D: Appl. Phys. 1988, 21, 838.
11. X. Wang, H. Luo, Z. Liang, T. Mao, R. Ma, Plasma Sources Sci. Technol 2006, 15, 845.
12. H. Ayan, G. Fridman, A. F. Gutsol, V. N. Vasilets, A. Fridman, G. Friedman, IEEE Trans. Plasma Sci. 2008, 36, 504.
13. J. L. Walsh, Z. Cao, M. G. Kong, IEEE Trans. Plasma Sci. 2008, 36, 1314.
14. N. Gherardi, G. Gouda, E. Gat, A. Ricard, F. Massines, Plasma Sources Sci. Technol. 2000, 9, 340.
15. J. Ráhel, D. M. Sherman, J. Phys. D: Appl. Phys. 2005, 38, 547.
16. K. V. Kozlov, H. E. Wagner, R. Brandenburg, P. Michel, J. Phys. D: Appl. Phys. 2001, 34, 3164.
17. C. Kaemling, A. Kaemling, S. Tuemmel, W. Vioel, Surf. Coat. Technol. 2005, 200. 668.
18. S. Tuemmel, N. Mertens, J. Wang, W. Vioel, Plasma Processes Polym. 2007, 4, S465.
19. M. Kuchenbecker, N. Bibinov, A. Kaemlimg, D. Wandke, P. Awakowicz, W. Vioel, J. Phys. D: Appl. Phys. 2009, 42, 045212.
20. P. Rajasekaran, P. Mertmann, N. Bibinov, D. Wandke, W. Vioel, P. Awakowicz, J. Phys. D: Appl. Phys. 2009, 42, 225201.
21. N. Bibinov, H. Halfmann, P. Awakowicz, K. Wiesemann, Meas. Sci. Technol. 2007, 18, 1327.
22. S. V. Pancheshnyi, S. M. Starikovskaia, A. Y. Starikovskii, Chem. Phys. 2000, 262, 349.
23. Y. Itikawa, J. Phys. Chem. Ref. Data 2006, 35, 31.
24. Y. Itikawa, A. Ichimura, K. Onda, K. Sakimoto, K. Takayanagi, Y. Hatano, M. Hayashi, H. Nishimura, H. S. Tsurubuchi, J. Phys. Chem. Ref. Data 1989, 18, 23.
25. Code EEDF, available from A. P. Napartovich, Triniti Institute for Innovation and Fusion Research, Troizk, Moscow Region, Russia.
26. I. Stefanovic, N. K. Bibinov, A. A. Deryugin, I. P. Vinogradov, A. P. Napartovich, K. Wiesemann, Plasma Sources Sci. Technol. 2001, 10, 406.
27. F. Kohlrausch, Praktische Physik, Vol. 3, B. G. Teubner Stuttgart, Stuttgart 1996, p. 356.
28. T. R. Marrero, E. A. Mason, J. Phys. Chem. Ref. Data 1972, 1, 3.
29. B. Eliasson, M. Hirth, U. Kogelschatz, J. Phys. D: Appl. Phys. 1987, 20, 1421.
30. H. Ayan, D. Staack, G. Fridman, A. Gutsol, Y. Mukhin, A. Starikovskii, A. Fridman, G. Friedman, J. Phys. D: Appl. Phys. 2009, 42, 125202.
31. X. Lu, M. Laroussi, J. Appl. Phys. 2006, 100, 63302.
32. Y. P. Raizer, Gas Discharge Physics, Springer-Verlag, Berlin, Heidelberg, New York 1997, pp. 336-337.
33. D. Bruch-Gerhurz, T. Ruzicka, V. Kolb-Bachofen, J. Invest. Dermatol. 1998, 110, 1.
34. M. M. Cals-Grierson, A. D. Ormerod, Nitric Oxide 2004, 10, 179.
35. B. B. Childress, J. K. Stechmiller, Biological Res. Nursing 2002, 4, 5.
36. J. M. Williamson, D. D. Trump, P. Bletzinger, B. N. Ganguly, J. Phys. D: Appl. Phys. 2006, 39, 4400.
37. J. Jekler, O. Larko, J. Am. Acad. Dermatol. 1990, 22, 49.
38. A. I. Zakharov, K. S. Klopovskii, A. P. Osipov, A. M. Popov, O. B. Popovicheva, T. V. Rakhimova, V. A. Samorodov, A. P. Sokolov, Sov. J. Plasma Phys. 1988, 14, 191.
39. S. Mukkavilli, C. K. Lee, K. Varghese, L. L. Tavlarides, IEEE Trans. Plasma Sci. 1988, 16, 652.
40. M. J. McEwan, L. F. Phillips, Chemistry of the Atmosphere, Arnold, London 1975.
41. R. Atkinson, D. L. Baulch, R. A. Cox, R. F. Hampson, Jr., J. A. Kerr, J. Troe, J. Chem. Phys. Ref. Data 1989, 18, 881.
42. M. E. Fraser, L. G. Piper, J. Phys. Chem. 1989, 93, 1107.
43. V. F. Larin, Sov. Tech. Phys. Lett. 1990, 16, 319.
44. L. G. Piper, J. Chem. Phys. 1988, 88, 231.