Photopatterning of self-assembled poly (ethylene) glycol monolayer for neuronal network fabrication

Journal of Neuroscience Methods

Volumn 213, Issue 2, 2013, Pages 196-203

  Cheng, Ji ^a,b,c,d   Zhu, Geng ^b,c   Wu, Lei ^a,b,c   Du, Xiaowei ^a,b,c,d   Zhang, Huanqian ^a,b,c,d   Wolfrum, Bernhard ^b,c   Jin, Qinghui ^a,b,c   Zhao, Jianlong ^a,b,c   Offenhäusser, Andreas ^b,c   Xu, Yuansen ^a,b,c  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^d UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Chemical vapor deposited silanization; Lithography; Microelectrode arrays; Neuronal activity; Neuronal patterning; Poly (ethylene) glycol

Indexed keywords

MACROGOL; SELF ASSEMBLED MONOLAYER;

ARTICLE; BRAIN CELL; BRAIN MAPPING; CHEMICAL VAPOR DEPOSITED SILANIZATION; DEGRADATION KINETICS; INFORMATION PROCESSING; MICROELECTRODE; NERVE CELL NETWORK; OXYGEN PLASMA ETCHING; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; PRIORITY JOURNAL; PROCEDURES CONCERNING CELLS; VAPOR;

ACTION POTENTIALS; ANIMALS; CELL CULTURE TECHNIQUES; NERVE NET; NEURONS; POLYETHYLENE GLYCOLS; RATS; RATS, WISTAR;

EID: 84872728143     PISSN: 01650270     EISSN: 1872678X     Source Type: Journal    
DOI: 10.1016/j.jneumeth.2012.12.020     Document Type: Article

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