Experimental and simulation studies of antireflection sub-micron conical structures on a gaas substrate

Optics Express

Volumn 21, Issue 101, 2013, Pages A36-A41

  Lee, Yeeu Chang ^a   Chang, Che Chun ^a   Chou, Yen Yu ^a  

^a CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM ARSENIDE;

ANTI REFLECTIVE COATINGS; ANTI-REFLECTION; ANTI-REFLECTION STRUCTURES; COLLOIDAL LITHOGRAPHY; CONICAL STRUCTURES; DEGREE OF SIMILARITY; DRY ETCHING PROCESS; ETCHING GAS; ETCHING PARAMETERS; GAAS SUBSTRATES; GAAS WAFER; PHOTOELECTRIC CONVERSION; RF-POWER; RIGOROUS COUPLED WAVE ANALYSIS; SIMULATION STUDIES; SPECTRAL RANGE; SUBMICRON; SURFACE REFLECTIONS;

REFLECTIVE COATINGS;

GALLIUM; GALLIUM ARSENIDE; NANOMATERIAL; ORGANOARSENIC DERIVATIVE;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; LIGHT; METHODOLOGY; NANOTECHNOLOGY; POWER SUPPLY; RADIATION SCATTERING; REFRACTOMETRY; SOLAR ENERGY;

ARSENICALS; ELECTRIC POWER SUPPLIES; EQUIPMENT DESIGN; GALLIUM; LIGHT; NANOSTRUCTURES; NANOTECHNOLOGY; REFRACTOMETRY; SCATTERING, RADIATION; SOLAR ENERGY;

MLCS; MLOWN;

EID: 84872724702     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.000A36     Document Type: Article

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