Electronic origin of ultrafast photoinduced strain in BiFeO3

Physical Review Letters

Volumn 110, Issue 3, 2013, Pages

  Wen, Haidan ^a   Chen, Pice ^b   Cosgriff, Margaret P ^b   Walko, Donald A ^a   Lee, June Hyuk ^a   Adamo, Carolina ^c   Schaller, Richard D ^a,d   Ihlefeld, Jon F ^e   Dufresne, Eric M ^a   Schlom, Darrell G ^c,f   Evans, Paul G ^b   Freeland, John W ^a   Li, Yuelin ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b University of Wisconsin Madison   (United States)

^c School of Chemical and Molecular Engineering   (United States)

^d NORTHWESTERN UNIVERSITY   (United States)

^e SANDIA NATIONAL LABORATORIES   (United States)

^f Kavli Institute at Cornell for Nanoscale Science ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOLARIZATION FIELDS; ELECTRONIC MECHANISMS; ELECTRONIC ORIGIN; ELECTRONIC TRANSPORT; EXCITED CARRIERS; INTERBAND; LATTICE EXPANSION; MULTIFERROICS; NONTHERMAL; OUT-OF-PLANE; PARTIAL SCREENING; PHOTO-INDUCED; SUBNANOSECOND TIME SCALE; SYNCHROTRON X RAY DIFFRACTION; TEMPORAL CORRELATIONS; TIME DEPENDENCE; TIME-RESOLVED; ULTRA-FAST;

CHARGE CARRIERS; LASER EXCITATION; X RAY DIFFRACTION;

STRAIN;

EID: 84872705081     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.110.037601     Document Type: Article

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