High mobility single-crystalline-like germanium thin films on flexible, inexpensive substrates

Thin Solid Films

Volumn 527, Issue , 2013, Pages 9-15

  Wang, R ^a   Sambandam, S N ^b   Majkic, G ^a   Galstyan, E ^a   Selvamanickam, V ^a  

^a University of Houston   (United States)

^b SUPERPOWER INC   (United States)

Author keywords

Epitaxy; Flexible substrates; Germanium; Ion beam assisted deposition; Keywords; Mobility; Photovoltaics; Sputtering; Thin films

Indexed keywords

CRYSTALLOGRAPHIC ORIENTATIONS; CRYSTALLOGRAPHIC TEXTURES; DEPOSITION TEMPERATURES; FLEXIBLE SUBSTRATE; GERMANIUM FILMS; HIGH MOBILITY; INTERMEDIATE LAYERS; KEYWORDS; METALLIC SUBSTRATE; MICROSTRUCTURAL CHANGES; MOBILITY VALUE; P-TYPE; PHOTOVOLTAICS; POLYCRYSTALLINE;

CARRIER MOBILITY; CRYSTALLINE MATERIALS; EPITAXIAL FILMS; EPITAXIAL GROWTH; FILM THICKNESS; ION BEAM ASSISTED DEPOSITION; SPUTTERING; SUBSTRATES; THIN FILMS;

GERMANIUM;

EID: 84872609956     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.12.041     Document Type: Article

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