Progress in high throughput processing of long-length, high quality, and low cost IBAD MgO buffer tapes at superpower

IEEE Transactions on Applied Superconductivity

Volumn 19, Issue 3, 2009, Pages 3319-3322

  Xiong, Xuming ^a   Kim, Sungjin ^a   Zdun, Karol ^a   Sambandam, Senthil ^a   Rar, Andrei ^a   Lenseth, Kenneth P ^a   Selvamanickam, Venkat ^a  

^a SUPERPOWER INC   (United States)

Author keywords

Buffer; Coated conductor; High throughput; IBAD MgO

Indexed keywords

ALLOY TARGET; BUFFER; BUFFER SYSTEM; COATED CONDUCTOR; DRIVING SYSTEMS; EQUIVALENT SPEED; HIGH QUALITY; HIGH RATE; HIGH THROUGHPUT; IBAD MGO; ION-BEAM SPUTTERING; LOW COSTS; MANUFACTURING PROCESS; MGO-BUFFER; PROCESS SPEED; PROCESS STABILITY; PRODUCTION CAPACITY; PRODUCTION SPEED; REACTIVE ION BEAM SPUTTERING; REACTIVE MAGNETRON SPUTTERING; RUN TO RUN; TIME STABILITY; TRANSITION MODES;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ION BEAMS; LANTHANUM ALLOYS; MANGANESE; MANGANESE COMPOUNDS; SPEED; SPUTTERING; SYSTEM STABILITY;

THROUGHPUT;

EID: 68649090150     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2009.2018816     Document Type: Conference Paper

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