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Volumn 116, Issue 51, 2012, Pages 26929-26931

Competitive growth and etching of epitaxial graphene

Author keywords

[No Author keywords available]

Indexed keywords

COMPETITIVE GROWTH; CRITICAL FACTORS; EPITAXIAL GRAPHENE; ETCHING EFFECT; ETCHING PROCESS; GROWTH EFFECTS; HYDROGEN RADICAL; LATERAL GROWTH; LAYER THICKNESS; NUCLEATION DENSITIES; PERFECT LATTICE; REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; RISING TEMPERATURES;

EID: 84871668085     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp310134g     Document Type: Article
Times cited : (20)

References (21)
  • 2
    • 67649225738 scopus 로고    scopus 로고
    • Geim, A. K. Science 2009, 324, 1530-1534
    • (2009) Science , vol.324 , pp. 1530-1534
    • Geim, A.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.