Chemical vapor deposition of graphene on liquid metal catalysts

Carbon

Volumn 53, Issue , 2013, Pages 321-326

  Ding, Guqiao ^a   Zhu, Yun ^a,b   Wang, Shumin ^a,c   Gong, Qian ^a   Sun, Lei ^a   Wu, Tianru ^a   Xie, Xiaoming ^a   Jiang, Mianheng ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHANGZHOU UNIVERSITY   (China)

^c CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITIONS; CATALYTIC ABILITY; CATALYTIC BEHAVIOR; GRAPHENE GROWTH; GROWTH CHARACTERISTIC; HIGH TEMPERATURE; HYDROGEN FLOW; LIQUID CATALYST; LIQUID GALLIUM; LIQUID SURFACE; METAL CATALYST; METALS AND ALLOYS; ROOM TEMPERATURE; SOLID CATALYSTS; TIME-DEPENDENT; TIN-COPPER;

CATALYSTS; CHEMICAL VAPOR DEPOSITION; GALLIUM; HYDROGEN; LIQUID METALS; METALLURGY; MOLTEN MATERIALS; TIN; VAPORS;

GRAPHENE;

EID: 84871324473     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2012.11.018     Document Type: Article

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